Copper (Cu)-gate AlGaN/GaN High Electron Mobility Transistors have been already proposed by Ao et al. [5] and more recently by Sun et al. [6]. Gate leakage currents, Schottky barrier heights and other small signal parameters have found to be very interesting for Cu-gate devices. The aim of our work is to evaluate the large signal characteristics, giving a direct comparison between Cu-gate device and Ni/Au-gate one.
Influence of interface states at Schottky junction on the large signal behaviour of Cu-gate standard AlGaN/GaN HEMTs / Esposto, Michele; DI LECCE, Valerio; Bonaiuti, Matteo; Fantini, Fausto; Verzellesi, Giovanni; De Guido, S.; De Vittorio, M.; Passaseo, A.; Chini, Alessandro. - (2009). (Intervento presentato al convegno 18th European Workshop on Heterostructure Technology - HETECH 2009 tenutosi a Günzburg / Ulm, Germany nel 2-4 November 2009).
Influence of interface states at Schottky junction on the large signal behaviour of Cu-gate standard AlGaN/GaN HEMTs
ESPOSTO, Michele;DI LECCE, Valerio;BONAIUTI, Matteo;FANTINI, Fausto;VERZELLESI, Giovanni;CHINI, Alessandro
2009
Abstract
Copper (Cu)-gate AlGaN/GaN High Electron Mobility Transistors have been already proposed by Ao et al. [5] and more recently by Sun et al. [6]. Gate leakage currents, Schottky barrier heights and other small signal parameters have found to be very interesting for Cu-gate devices. The aim of our work is to evaluate the large signal characteristics, giving a direct comparison between Cu-gate device and Ni/Au-gate one.File | Dimensione | Formato | |
---|---|---|---|
Hetech_2009.pdf
Accesso riservato
Tipologia:
Altro
Dimensione
492.69 kB
Formato
Adobe PDF
|
492.69 kB | Adobe PDF | Visualizza/Apri Richiedi una copia |
Pubblicazioni consigliate
I metadati presenti in IRIS UNIMORE sono rilasciati con licenza Creative Commons CC0 1.0 Universal, mentre i file delle pubblicazioni sono rilasciati con licenza Attribuzione 4.0 Internazionale (CC BY 4.0), salvo diversa indicazione.
In caso di violazione di copyright, contattare Supporto Iris