In this work, the critical role of carbon doping in the electrical behavior of AlGaN/GaN High Electron Mobility Transistors (HEMTs) on semi-insulating SiC substrates is assessed by investigating the off-state three terminal breakdown, current collapse and dynamic on-resistance recovery at high drain-source voltages. Extensive device simulations of typical GaN HEMT structures are carried out and compared to experimental data from published, state-of-the-art technologies to: i) explain the slope of the breakdown voltage as a function of the gate-to-drain spacing lower than GaN critical electric field as a result of the non-uniform electrical field distribution in the gate-drain access region; ii) attribute the drain current collapse to trapping in deep acceptor states in the buffer associated with carbon doping; iii) interpret the partial dynamic on-resistance recovery after off-state stress at high drain-source voltages as a consequence of hole generation and trapping.
The Role of Carbon Doping on Breakdown, Current Collapse and Dynamic On-Resistance Recovery in AlGaN/GaN High Electron Mobility Transistors on Semi‐Insulating SiC Substrates / Zagni, Nicolò; Chini, Alessandro; Puglisi, Francesco Maria; Pavan, Paolo; Verzellesi, Giovanni. - In: PHYSICA STATUS SOLIDI. RAPID RESEARCH LETTERS. - ISSN 1862-6254. - 217:7(2020), pp. 1900762-1-1900762-5. [10.1002/pssa.201900762]
The Role of Carbon Doping on Breakdown, Current Collapse and Dynamic On-Resistance Recovery in AlGaN/GaN High Electron Mobility Transistors on Semi‐Insulating SiC Substrates
Zagni, Nicolò
;Chini, Alessandro;Puglisi, Francesco Maria;Pavan, Paolo;Verzellesi, Giovanni
2020
Abstract
In this work, the critical role of carbon doping in the electrical behavior of AlGaN/GaN High Electron Mobility Transistors (HEMTs) on semi-insulating SiC substrates is assessed by investigating the off-state three terminal breakdown, current collapse and dynamic on-resistance recovery at high drain-source voltages. Extensive device simulations of typical GaN HEMT structures are carried out and compared to experimental data from published, state-of-the-art technologies to: i) explain the slope of the breakdown voltage as a function of the gate-to-drain spacing lower than GaN critical electric field as a result of the non-uniform electrical field distribution in the gate-drain access region; ii) attribute the drain current collapse to trapping in deep acceptor states in the buffer associated with carbon doping; iii) interpret the partial dynamic on-resistance recovery after off-state stress at high drain-source voltages as a consequence of hole generation and trapping.File | Dimensione | Formato | |
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