In this paper, the authors present an experimental analysis on current conduction mechanisms in high-k oxides, where two metal–insulator–metal structures with different insulators (HfO2 and HfO2-x) are considered. Current density measurements indicate the existence of a perimeter-related component in the current, sizeable in HfO2, and negligible in HfO2-x samples, which have to be taken into account for a correct analysis of the device behavior and cannot be based only on the area scaling rules. For oxide breakdown, for example, a significant contribution of the perimeter-related current component results in conservative extrapolations of breakdown voltages for scaled devices.

Perimeter and area current components in HfO2 and HfO2-x metal-insulator-metal capacitors / Puglisi, Francesco Maria; Pavan, Paolo; Padovani, Andrea; Larcher, Luca. - In: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY. A. VACUUM, SURFACES, AND FILMS. - ISSN 0734-2101. - ELETTRONICO. - 31:1(2013), pp. 01A117-1-01A117-5. [10.1116/1.4774104]

Perimeter and area current components in HfO2 and HfO2-x metal-insulator-metal capacitors

PUGLISI, Francesco Maria;PAVAN, Paolo;PADOVANI, ANDREA;LARCHER, Luca
2013

Abstract

In this paper, the authors present an experimental analysis on current conduction mechanisms in high-k oxides, where two metal–insulator–metal structures with different insulators (HfO2 and HfO2-x) are considered. Current density measurements indicate the existence of a perimeter-related component in the current, sizeable in HfO2, and negligible in HfO2-x samples, which have to be taken into account for a correct analysis of the device behavior and cannot be based only on the area scaling rules. For oxide breakdown, for example, a significant contribution of the perimeter-related current component results in conservative extrapolations of breakdown voltages for scaled devices.
2013
31
1
01A117-1
01A117-5
Perimeter and area current components in HfO2 and HfO2-x metal-insulator-metal capacitors / Puglisi, Francesco Maria; Pavan, Paolo; Padovani, Andrea; Larcher, Luca. - In: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY. A. VACUUM, SURFACES, AND FILMS. - ISSN 0734-2101. - ELETTRONICO. - 31:1(2013), pp. 01A117-1-01A117-5. [10.1116/1.4774104]
Puglisi, Francesco Maria; Pavan, Paolo; Padovani, Andrea; Larcher, Luca
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11380/884290
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