In this paper, the authors present an experimental analysis on current conduction mechanisms in high-k oxides, where two metal–insulator–metal structures with different insulators (HfO2 and HfO2-x) are considered. Current density measurements indicate the existence of a perimeter-related component in the current, sizeable in HfO2, and negligible in HfO2-x samples, which have to be taken into account for a correct analysis of the device behavior and cannot be based only on the area scaling rules. For oxide breakdown, for example, a significant contribution of the perimeter-related current component results in conservative extrapolations of breakdown voltages for scaled devices.
Perimeter and area current components in HfO2 and HfO2-x metal-insulator-metal capacitors / Puglisi, Francesco Maria; Pavan, Paolo; Padovani, Andrea; Larcher, Luca. - In: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY. B. - ISSN 1071-1023. - ELETTRONICO. - 31(2013), pp. 01A117-1-01A117-5.
Data di pubblicazione: | 2013 |
Titolo: | Perimeter and area current components in HfO2 and HfO2-x metal-insulator-metal capacitors |
Autore/i: | Puglisi, Francesco Maria; Pavan, Paolo; Padovani, Andrea; Larcher, Luca |
Autore/i UNIMORE: | |
Digital Object Identifier (DOI): | http://dx.doi.org/10.1116/1.4774104 |
Rivista: | |
Volume: | 31 |
Pagina iniziale: | 01A117-1 |
Pagina finale: | 01A117-5 |
Codice identificativo ISI: | WOS:000313672600017 |
Codice identificativo Scopus: | 2-s2.0-84872729333 |
Citazione: | Perimeter and area current components in HfO2 and HfO2-x metal-insulator-metal capacitors / Puglisi, Francesco Maria; Pavan, Paolo; Padovani, Andrea; Larcher, Luca. - In: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY. B. - ISSN 1071-1023. - ELETTRONICO. - 31(2013), pp. 01A117-1-01A117-5. |
Tipologia | Articolo su rivista |
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