Tuneable phase plates for free electrons are a highly active area of research. However, their widespread implementation, similar to that of spatial light modulators in light optics, has been hindered by both conceptual and technical challenges. A specific technical challenge involves the need to minimize obstruction of the electron beam by supporting films and electrodes. Here, we describe numerical and analytical mathematical frameworks for three-dimensional stacks of phase plates that can be used to provide near-arbitrary electron beam shaping with minimal obstruction.

Three-dimensional Stacking of Phase Plates for Advanced Electron Beam Shaping / Ruffato, G., Beleggia, M., Tavabi, A.H., Rotunno, E., Viani, L., Rosi, P., Kavkani, P.H., Chiari, C., Frabboni, S., Gazzadi, G.C., Pozzi, G., Bertoni, G., Tiemeijer, P., Dunin-Borkowski, R.E., Grillo, V.. - In: MICROSCOPY AND MICROANALYSIS. - ISSN 1435-8115. - 31:1(2025), pp. 1-11. [10.1093/mam/ozae108]

Three-dimensional Stacking of Phase Plates for Advanced Electron Beam Shaping

Ruffato, Gianluca;Beleggia, Marco;Rotunno, Enzo;Viani, Lorenzo;Rosi, Paolo;Kavkani, Payam Habibzadeh;Chiari, Caterina;Frabboni, Stefano;Gazzadi, Gian Carlo;Pozzi, Giulio;Grillo, Vincenzo
2025

Abstract

Tuneable phase plates for free electrons are a highly active area of research. However, their widespread implementation, similar to that of spatial light modulators in light optics, has been hindered by both conceptual and technical challenges. A specific technical challenge involves the need to minimize obstruction of the electron beam by supporting films and electrodes. Here, we describe numerical and analytical mathematical frameworks for three-dimensional stacks of phase plates that can be used to provide near-arbitrary electron beam shaping with minimal obstruction.
2025
Inglese
31
1
1
11
Bessel beams; beam shaping; conformal mappings; electron optics; iterative methods
none
info:eu-repo/semantics/article
Contributo su RIVISTA::Articolo su rivista
262
Three-dimensional Stacking of Phase Plates for Advanced Electron Beam Shaping / Ruffato, G., Beleggia, M., Tavabi, A.H., Rotunno, E., Viani, L., Rosi, P., Kavkani, P.H., Chiari, C., Frabboni, S., Gazzadi, G.C., Pozzi, G., Bertoni, G., Tiemeijer, P., Dunin-Borkowski, R.E., Grillo, V.. - In: MICROSCOPY AND MICROANALYSIS. - ISSN 1435-8115. - 31:1(2025), pp. 1-11. [10.1093/mam/ozae108]
Ruffato, Gianluca; Beleggia, Marco; Tavabi, Amir Hossein; Rotunno, Enzo; Viani, Lorenzo; Rosi, Paolo; Kavkani, Payam Habibzadeh; Chiari, Caterina; Fra...espandi
15
File in questo prodotto:
Non ci sono file associati a questo prodotto.
Pubblicazioni consigliate

Licenza Creative Commons
I metadati presenti in IRIS UNIMORE sono rilasciati con licenza Creative Commons CC0 1.0 Universal, mentre i file delle pubblicazioni sono rilasciati con licenza Attribuzione 4.0 Internazionale (CC BY 4.0), salvo diversa indicazione.
In caso di violazione di copyright, contattare Supporto Iris

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11380/1394249
Citazioni
  • ???jsp.display-item.citation.pmc??? 1
  • Scopus 0
  • ???jsp.display-item.citation.isi??? 0
social impact