We report a systematic treatment of the holographic generation of electron Bessel beams, with a view to applications in electron microscopy. We describe in detail the theory underlying hologram patterning, as well as the actual electron-optical configuration used experimentally. We show that by optimizing our nanofabrication recipe, electron Bessel beams can be generated with relative efficiencies reaching 37±3%. We also demonstrate by tuning various hologram parameters that electron Bessel beams can be produced with many visible rings, making them ideal for interferometric applications, or in more highly localized forms with fewer rings, more suitable for imaging. We describe the settings required to tune beam localization in this way, and explore beam and hologram configurations that allow the convergences and topological charges of electron Bessel beams to be controlled. We also characterize the phase structure of the Bessel beams generated with our technique, using a simulation procedure that accounts for imperfections in the hologram manufacturing process.

Generation and application of bessel beams in electron microscopy / Grillo, Vincenzo; Harris, Jérémie; Gazzadi, Gian Carlo; Balboni, Roberto; Mafakheribashmagh, Erfan; Dennis, Mark R.; Frabboni, Stefano; Boyd, Robert W.; Karimi, Ebrahim. - In: ULTRAMICROSCOPY. - ISSN 0304-3991. - STAMPA. - 166:(2016), pp. 48-60. [10.1016/j.ultramic.2016.03.009]

Generation and application of bessel beams in electron microscopy

GRILLO, VINCENZO;GAZZADI, gian carlo;MAFAKHERIBASHMAGH, ERFAN;FRABBONI, Stefano;
2016

Abstract

We report a systematic treatment of the holographic generation of electron Bessel beams, with a view to applications in electron microscopy. We describe in detail the theory underlying hologram patterning, as well as the actual electron-optical configuration used experimentally. We show that by optimizing our nanofabrication recipe, electron Bessel beams can be generated with relative efficiencies reaching 37±3%. We also demonstrate by tuning various hologram parameters that electron Bessel beams can be produced with many visible rings, making them ideal for interferometric applications, or in more highly localized forms with fewer rings, more suitable for imaging. We describe the settings required to tune beam localization in this way, and explore beam and hologram configurations that allow the convergences and topological charges of electron Bessel beams to be controlled. We also characterize the phase structure of the Bessel beams generated with our technique, using a simulation procedure that accounts for imperfections in the hologram manufacturing process.
2016
26-mar-2016
166
48
60
Generation and application of bessel beams in electron microscopy / Grillo, Vincenzo; Harris, Jérémie; Gazzadi, Gian Carlo; Balboni, Roberto; Mafakheribashmagh, Erfan; Dennis, Mark R.; Frabboni, Stefano; Boyd, Robert W.; Karimi, Ebrahim. - In: ULTRAMICROSCOPY. - ISSN 0304-3991. - STAMPA. - 166:(2016), pp. 48-60. [10.1016/j.ultramic.2016.03.009]
Grillo, Vincenzo; Harris, Jérémie; Gazzadi, Gian Carlo; Balboni, Roberto; Mafakheribashmagh, Erfan; Dennis, Mark R.; Frabboni, Stefano; Boyd, Robert W...espandi
File in questo prodotto:
File Dimensione Formato  
1-s2.0-S0304399116300286-main.pdf

Accesso riservato

Tipologia: Versione pubblicata dall'editore
Dimensione 1.6 MB
Formato Adobe PDF
1.6 MB Adobe PDF   Visualizza/Apri   Richiedi una copia
Pubblicazioni consigliate

Licenza Creative Commons
I metadati presenti in IRIS UNIMORE sono rilasciati con licenza Creative Commons CC0 1.0 Universal, mentre i file delle pubblicazioni sono rilasciati con licenza Attribuzione 4.0 Internazionale (CC BY 4.0), salvo diversa indicazione.
In caso di violazione di copyright, contattare Supporto Iris

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11380/1113960
Citazioni
  • ???jsp.display-item.citation.pmc??? 5
  • Scopus 43
  • ???jsp.display-item.citation.isi??? 41
social impact