The optical absorption of an UHV cleaved (111) surface of Si has been investigated as a function of the exposure to oxygen. Data concerning the disappearing of surface states with oxidation are reported. The sticking coefficient for oxygen of a clean surface of Si is calculated from optical absorption data.
Optical properties of the clean and slowly oxidized surface of silicon / P., Chiaradia; Nannarone, Stefano. - In: SURFACE SCIENCE. - ISSN 0039-6028. - STAMPA. - 54:(1976), pp. 547-552.
Optical properties of the clean and slowly oxidized surface of silicon
NANNARONE, Stefano
1976
Abstract
The optical absorption of an UHV cleaved (111) surface of Si has been investigated as a function of the exposure to oxygen. Data concerning the disappearing of surface states with oxidation are reported. The sticking coefficient for oxygen of a clean surface of Si is calculated from optical absorption data.
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