We present an experimental study of aging and thermal stability of Sc/Si multilayers deposited by magnetron sputtering. These multilayers have been characterized by using hard X-ray grazing incidence reflectometry at 0.154 nm and synchrotron radiation reflectometry at near normal incidence. The reflectivity was found to be stable after one year. A maximum reflectivity of 46% has been measured at 46 nm. However a 20% relative decrease of the reflectivity have been observed after one hour thermal annealing at 200°C. In order to improve thermal stability, we studied two different barriers layers (B4C and ScN). We compare the decrease of peak reflectivity and its wavelength shift after one hour annealing at 200°C under argon atmosphere. The best result was observed with the design using 0.3 nm B4C barrier layers. A relative decrease of 2% of the reflectivity peak has been observed with this design as compared to a 20% decrease without barrier layers.
Performances and stability of Sc/Si multilayers with barrier layers for wavelengths around 46 nmProceedings of SPIE / Julien, Gautier; Nannarone, Stefano. - STAMPA. - 5963:(2005), pp. 59630X-59630X-8. (Intervento presentato al convegno Advances in Optical Thin Films II tenutosi a Jena , Germania nel 13 September 2005 through 15 September 2005) [10.1117/12.625030].
Performances and stability of Sc/Si multilayers with barrier layers for wavelengths around 46 nmProceedings of SPIE
NANNARONE, Stefano
2005
Abstract
We present an experimental study of aging and thermal stability of Sc/Si multilayers deposited by magnetron sputtering. These multilayers have been characterized by using hard X-ray grazing incidence reflectometry at 0.154 nm and synchrotron radiation reflectometry at near normal incidence. The reflectivity was found to be stable after one year. A maximum reflectivity of 46% has been measured at 46 nm. However a 20% relative decrease of the reflectivity have been observed after one hour thermal annealing at 200°C. In order to improve thermal stability, we studied two different barriers layers (B4C and ScN). We compare the decrease of peak reflectivity and its wavelength shift after one hour annealing at 200°C under argon atmosphere. The best result was observed with the design using 0.3 nm B4C barrier layers. A relative decrease of 2% of the reflectivity peak has been observed with this design as compared to a 20% decrease without barrier layers.
Pubblicazioni consigliate
I metadati presenti in IRIS UNIMORE sono rilasciati con licenza Creative Commons CC0 1.0 Universal, mentre i file delle pubblicazioni sono rilasciati con licenza Attribuzione 4.0 Internazionale (CC BY 4.0), salvo diversa indicazione.
In caso di violazione di copyright, contattare Supporto Iris
