B4C optical coating represents, together with Ir, Pt, SiC, one of best choice for high reflectance in the extreme ultraviolet region (EUV 160-30 nm). This material is also used in multilayer for soft X-ray applications, such as Si/B4C or W/B4C, or as interlayer in Mo/Si multilayer to avoid interdiffusion also because of its high thermal stability. Our work concerns on B4C thin films deposited on Si [100] substrates by means of three different deposition techniques: RF plasma magnetron sputtering, e-beam evaporation, pulsed laser ablation (PLD). We performed reflectance vs incidence angle measurements from 5 nm to 152 nm on different samples deriving the optical constants with a least-square fitting method. Complete films characterization have been carried out with compositional (XPS), structural (XRD) and morphological (AFM, SEM) analyses.
Optical constants in the EUV soft x-ray (5÷152 nm) spectral range of BProceedings of SPIE / G., Monaco; D., Garoli; R., Frison; V., Mattarello; P., Nicolosi; M. G., Pelizzo; V., Rigato; L., Armelao; A., Giglia; Nannarone, Stefano. - STAMPA. - 6317:(2006), pp. 631712-631712-12. (Intervento presentato al convegno Conference on Advances in X-Ray/EUV Optics, Components and Applications tenutosi a San Diego, CA nel AUG 14-16, 2006) [10.1117/12.684088].
Optical constants in the EUV soft x-ray (5÷152 nm) spectral range of BProceedings of SPIE
D. Garoli;NANNARONE, Stefano
2006
Abstract
B4C optical coating represents, together with Ir, Pt, SiC, one of best choice for high reflectance in the extreme ultraviolet region (EUV 160-30 nm). This material is also used in multilayer for soft X-ray applications, such as Si/B4C or W/B4C, or as interlayer in Mo/Si multilayer to avoid interdiffusion also because of its high thermal stability. Our work concerns on B4C thin films deposited on Si [100] substrates by means of three different deposition techniques: RF plasma magnetron sputtering, e-beam evaporation, pulsed laser ablation (PLD). We performed reflectance vs incidence angle measurements from 5 nm to 152 nm on different samples deriving the optical constants with a least-square fitting method. Complete films characterization have been carried out with compositional (XPS), structural (XRD) and morphological (AFM, SEM) analyses.
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