We study the introduction of a third material, namely Zr, within a nanometric periodic Mg/Co structure designed to work as optical component in the extreme UV (EUV) spectral range. Mg/Co, Mg/Zr/Co, Mg/Co/Zr and Mg/Zr/Co/Zr multilayers are designed, and then characterized in terms of structural quality and optical performances through X-ray and EUV reflectometry measurements, respectively. For the Mg/Co/Zr structure, the reflectance value is equal to 50% at 25.1 nm and 45° of grazing incidence and reaches 51.3% upon annealing at 200°C. Measured EUV reflectivity values of tri-layered systems are discussed in terms of material order within a period and compared to the predictions of the theoretical model of Larruquert. Possible applications are pointed out.

Introduction of Zr in nanometric periodic Mg/Co multilayers / K., Le guen; M. H., Hu; J. M., André; P., Jonnard; S. K., Zhou; H. C., Li; J. T., Zhu; Z. S., Wang; N., Mahne; A., Giglia; Nannarone, Stefano. - In: APPLIED PHYSICS. A, MATERIALS SCIENCE & PROCESSING. - ISSN 0947-8396. - STAMPA. - 102:(2010), pp. 69-77. [10.1007/s00339-010-6093-2]

Introduction of Zr in nanometric periodic Mg/Co multilayers

NANNARONE, Stefano
2010

Abstract

We study the introduction of a third material, namely Zr, within a nanometric periodic Mg/Co structure designed to work as optical component in the extreme UV (EUV) spectral range. Mg/Co, Mg/Zr/Co, Mg/Co/Zr and Mg/Zr/Co/Zr multilayers are designed, and then characterized in terms of structural quality and optical performances through X-ray and EUV reflectometry measurements, respectively. For the Mg/Co/Zr structure, the reflectance value is equal to 50% at 25.1 nm and 45° of grazing incidence and reaches 51.3% upon annealing at 200°C. Measured EUV reflectivity values of tri-layered systems are discussed in terms of material order within a period and compared to the predictions of the theoretical model of Larruquert. Possible applications are pointed out.
2010
102
69
77
Introduction of Zr in nanometric periodic Mg/Co multilayers / K., Le guen; M. H., Hu; J. M., André; P., Jonnard; S. K., Zhou; H. C., Li; J. T., Zhu; Z. S., Wang; N., Mahne; A., Giglia; Nannarone, Stefano. - In: APPLIED PHYSICS. A, MATERIALS SCIENCE & PROCESSING. - ISSN 0947-8396. - STAMPA. - 102:(2010), pp. 69-77. [10.1007/s00339-010-6093-2]
K., Le guen; M. H., Hu; J. M., André; P., Jonnard; S. K., Zhou; H. C., Li; J. T., Zhu; Z. S., Wang; N., Mahne; A., Giglia; Nannarone, Stefano
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11380/742997
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