Current nanotechnology techniques make possible the preparation of slits in the submicrometer range so that electron interference and diffraction experiments can be done even with a conventional electron microscope. If the instrument is also equipped with a field emission source, it is possible to follow almost in real time the transition from the image of the slits to their Fraunhofer pattern through the intermediate Fresnel diffraction images. We discuss our results for the two-slit experiment and illustrate them for the three-slit case.
Two and three slit electron interference and diffraction experiments / Frabboni, Stefano; Frigeri, Cesare; Gazzadi Gian, Carlo; Pozzi, Giulio. - In: AMERICAN JOURNAL OF PHYSICS. - ISSN 0002-9505. - STAMPA. - 79:6(2011), pp. 615-618. [10.1119/1.3560429]
Two and three slit electron interference and diffraction experiments
FRABBONI, Stefano;
2011
Abstract
Current nanotechnology techniques make possible the preparation of slits in the submicrometer range so that electron interference and diffraction experiments can be done even with a conventional electron microscope. If the instrument is also equipped with a field emission source, it is possible to follow almost in real time the transition from the image of the slits to their Fraunhofer pattern through the intermediate Fresnel diffraction images. We discuss our results for the two-slit experiment and illustrate them for the three-slit case.
Pubblicazioni consigliate
I metadati presenti in IRIS UNIMORE sono rilasciati con licenza Creative Commons CC0 1.0 Universal, mentre i file delle pubblicazioni sono rilasciati con licenza Attribuzione 4.0 Internazionale (CC BY 4.0), salvo diversa indicazione.
In caso di violazione di copyright, contattare Supporto Iris
