We have tested the concept of image charge screening as a new approach to restore magnetic orderingtemperatures and superexchange interactions in correlated oxide ultrathin films. Using a three-monolayerNiO100 film grown on Ag100 and an identically thin film on MgO100 as model systems, we observedthat the Néel temperature of the NiO film on the highly polarizable metal substrate is 390 K while that of thefilm on the poorly polarizable insulator substrate is below 40 K. This demonstrates that screening by highlypolarizable media may point to a practical way toward designing strongly correlated oxide nanostructures withgreatly improved magnetic properties.

Image charge screening: A new approach to enhance magnetic ordering temperatures inultrathin correlated oxide films / S., Altieri; M., Finazzi; H. H., Hsieh; M. W., Haverkort; H. J., Lin; C. T., Chen; Frabboni, Stefano; G. C., Gazzadi; Rota, Alberto; Valeri, Sergio; L. H., Tjeng. - In: PHYSICAL REVIEW. B, CONDENSED MATTER AND MATERIALS PHYSICS. - ISSN 1098-0121. - STAMPA. - 79:17(2009), pp. 174431-N/A. [10.1103/PhysRevB.79.174431]

Image charge screening: A new approach to enhance magnetic ordering temperatures inultrathin correlated oxide films

FRABBONI, Stefano;ROTA, Alberto;VALERI, Sergio;
2009

Abstract

We have tested the concept of image charge screening as a new approach to restore magnetic orderingtemperatures and superexchange interactions in correlated oxide ultrathin films. Using a three-monolayerNiO100 film grown on Ag100 and an identically thin film on MgO100 as model systems, we observedthat the Néel temperature of the NiO film on the highly polarizable metal substrate is 390 K while that of thefilm on the poorly polarizable insulator substrate is below 40 K. This demonstrates that screening by highlypolarizable media may point to a practical way toward designing strongly correlated oxide nanostructures withgreatly improved magnetic properties.
2009
79
17
174431
N/A
Image charge screening: A new approach to enhance magnetic ordering temperatures inultrathin correlated oxide films / S., Altieri; M., Finazzi; H. H., Hsieh; M. W., Haverkort; H. J., Lin; C. T., Chen; Frabboni, Stefano; G. C., Gazzadi; Rota, Alberto; Valeri, Sergio; L. H., Tjeng. - In: PHYSICAL REVIEW. B, CONDENSED MATTER AND MATERIALS PHYSICS. - ISSN 1098-0121. - STAMPA. - 79:17(2009), pp. 174431-N/A. [10.1103/PhysRevB.79.174431]
S., Altieri; M., Finazzi; H. H., Hsieh; M. W., Haverkort; H. J., Lin; C. T., Chen; Frabboni, Stefano; G. C., Gazzadi; Rota, Alberto; Valeri, Sergio; L. H., Tjeng
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11380/618235
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