We have tested the concept of image charge screening as a new approach to restore magnetic orderingtemperatures and superexchange interactions in correlated oxide ultrathin films. Using a three-monolayerNiO100 film grown on Ag100 and an identically thin film on MgO100 as model systems, we observedthat the Néel temperature of the NiO film on the highly polarizable metal substrate is 390 K while that of thefilm on the poorly polarizable insulator substrate is below 40 K. This demonstrates that screening by highlypolarizable media may point to a practical way toward designing strongly correlated oxide nanostructures withgreatly improved magnetic properties.

Image charge screening: A new approach to enhance magnetic ordering temperatures inultrathin correlated oxide films / S., Altieri; M., Finazzi; H. H., Hsieh; M. W., Haverkort; H. J., Lin; C. T., Chen; Frabboni, Stefano; G. C., Gazzadi; Rota, Alberto; Valeri, Sergio; L. H., Tjeng. - In: PHYSICAL REVIEW. B, CONDENSED MATTER AND MATERIALS PHYSICS. - ISSN 1098-0121. - STAMPA. - 79:17(2009), pp. 174431-N/A. [10.1103/PhysRevB.79.174431]

Image charge screening: A new approach to enhance magnetic ordering temperatures inultrathin correlated oxide films

FRABBONI, Stefano;ROTA, Alberto;VALERI, Sergio;
2009

Abstract

We have tested the concept of image charge screening as a new approach to restore magnetic orderingtemperatures and superexchange interactions in correlated oxide ultrathin films. Using a three-monolayerNiO100 film grown on Ag100 and an identically thin film on MgO100 as model systems, we observedthat the Néel temperature of the NiO film on the highly polarizable metal substrate is 390 K while that of thefilm on the poorly polarizable insulator substrate is below 40 K. This demonstrates that screening by highlypolarizable media may point to a practical way toward designing strongly correlated oxide nanostructures withgreatly improved magnetic properties.
79
17
174431
N/A
Image charge screening: A new approach to enhance magnetic ordering temperatures inultrathin correlated oxide films / S., Altieri; M., Finazzi; H. H., Hsieh; M. W., Haverkort; H. J., Lin; C. T., Chen; Frabboni, Stefano; G. C., Gazzadi; Rota, Alberto; Valeri, Sergio; L. H., Tjeng. - In: PHYSICAL REVIEW. B, CONDENSED MATTER AND MATERIALS PHYSICS. - ISSN 1098-0121. - STAMPA. - 79:17(2009), pp. 174431-N/A. [10.1103/PhysRevB.79.174431]
S., Altieri; M., Finazzi; H. H., Hsieh; M. W., Haverkort; H. J., Lin; C. T., Chen; Frabboni, Stefano; G. C., Gazzadi; Rota, Alberto; Valeri, Sergio; L. H., Tjeng
File in questo prodotto:
Non ci sono file associati a questo prodotto.
Pubblicazioni consigliate

Caricamento pubblicazioni consigliate

Licenza Creative Commons
I metadati presenti in IRIS UNIMORE sono rilasciati con licenza Creative Commons CC0 1.0 Universal, mentre i file delle pubblicazioni sono rilasciati con licenza Attribuzione 4.0 Internazionale (CC BY 4.0), salvo diversa indicazione.
In caso di violazione di copyright, contattare Supporto Iris

Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/11380/618235
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 27
  • ???jsp.display-item.citation.isi??? 20
social impact