EnglishA discussion on the growth of thin metal films on metal substrates on the basis of the Auger technique is presented. Within a simple model the characteristics of the different growths are related to the adsorbate and substrate Auger peak-to-peak intensity ratios. The behavior of these ratios as a function of the number of deposited atoms is studied in the case of the Frank–van der Merwe, Volmer–Weber, and Stranski–Krastanov growth mechanism. A comparison between our calculations and reported measurements is discussed in detail for the Pd/W(110), Au/Pt(100), and Pt/Au(100) systems.
AES analysis of the growth mechanism of metal layers on metal surfaces / Ossicini, Stefano; Ciccacci, F; Memeo, R.. - In: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY. A. VACUUM, SURFACES, AND FILMS. - ISSN 0734-2101. - STAMPA. - A3(1985), pp. 387-391.
| Data di pubblicazione: | 1985 |
| Titolo: | AES analysis of the growth mechanism of metal layers on metal surfaces |
| Autore/i: | Ossicini, Stefano; Ciccacci, F; Memeo, R. |
| Autore/i UNIMORE: | |
| Rivista: | |
| Volume: | A3 |
| Pagina iniziale: | 387 |
| Pagina finale: | 391 |
| Codice identificativo ISI: | WOS:A1985AFE2200017 |
| Codice identificativo Scopus: | 2-s2.0-0141978972 |
| Citazione: | AES analysis of the growth mechanism of metal layers on metal surfaces / Ossicini, Stefano; Ciccacci, F; Memeo, R.. - In: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY. A. VACUUM, SURFACES, AND FILMS. - ISSN 0734-2101. - STAMPA. - A3(1985), pp. 387-391. |
| Tipologia | Articolo su rivista |
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