A discussion on the growth of thin metal films on metal substrates on the basis of the Auger technique is presented. Within a simple model the characteristics of the different growths are related to the adsorbate and substrate Auger peak-to-peak intensity ratios. The behavior of these ratios as a function of the number of deposited atoms is studied in the case of the Frank–van der Merwe, Volmer–Weber, and Stranski–Krastanov growth mechanism. A comparison between our calculations and reported measurements is discussed in detail for the Pd/W(110), Au/Pt(100), and Pt/Au(100) systems.
AES analysis of the growth mechanism of metal layers on metal surfaces / Ossicini, Stefano; Ciccacci, F; Memeo, R.. - In: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY. A. VACUUM, SURFACES, AND FILMS. - ISSN 0734-2101. - STAMPA. - A3:(1985), pp. 387-391.
AES analysis of the growth mechanism of metal layers on metal surfaces
OSSICINI, Stefano;
1985
Abstract
A discussion on the growth of thin metal films on metal substrates on the basis of the Auger technique is presented. Within a simple model the characteristics of the different growths are related to the adsorbate and substrate Auger peak-to-peak intensity ratios. The behavior of these ratios as a function of the number of deposited atoms is studied in the case of the Frank–van der Merwe, Volmer–Weber, and Stranski–Krastanov growth mechanism. A comparison between our calculations and reported measurements is discussed in detail for the Pd/W(110), Au/Pt(100), and Pt/Au(100) systems.
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