RuO2-based thick film resistors were studied by extended x-ray absorption fine structure. A bimodal distribution of RuO2 particle size has been determined by comparing the obtained results with x-ray diffraction data. The partial dissolution of RuO2 particles into the glassy matrix is suggested to be one of the principal mechanisms responsible for the electrical conduction in these materials. (C) 1999 American Institute of Physics. [S0021-8979(99)07217-5].
RuO2-based thick film resistors studied by extended x-ray absorption spectroscopy / C., Meneghini; S., Mobilio; F., Pivetti; I., Selmi; Prudenziati, Maria; Morten, Bruno. - In: JOURNAL OF APPLIED PHYSICS. - ISSN 0021-8979. - STAMPA. - 86:(1999), pp. 3590-3593.
RuO2-based thick film resistors studied by extended x-ray absorption spectroscopy
PRUDENZIATI, Maria;MORTEN, Bruno
1999
Abstract
RuO2-based thick film resistors were studied by extended x-ray absorption fine structure. A bimodal distribution of RuO2 particle size has been determined by comparing the obtained results with x-ray diffraction data. The partial dissolution of RuO2 particles into the glassy matrix is suggested to be one of the principal mechanisms responsible for the electrical conduction in these materials. (C) 1999 American Institute of Physics. [S0021-8979(99)07217-5].
Pubblicazioni consigliate
I metadati presenti in IRIS UNIMORE sono rilasciati con licenza Creative Commons CC0 1.0 Universal, mentre i file delle pubblicazioni sono rilasciati con licenza Attribuzione 4.0 Internazionale (CC BY 4.0), salvo diversa indicazione.
In caso di violazione di copyright, contattare Supporto Iris
