Reflectance versus incidence angle measurements have been performed from 5 to 152 nm on samples of SiC with a different C/Si ratio deposited with rf magnetron sputtering. The optical constants of the material at different wavelengths have been determined by using a curve-fitting technique of reflectance values versus incidence angle. Complementary measurements of the incident beam polarization, film thickness, surface roughness, and stoichiometry were performed to complete the analysis of the samples.
Reflectance measurements and optical constants in the extreme ultraviolet-vacuum ultraviolet regions for SiC with a different C/Si ratio / Garoli, D; Frassetto, F; Monaco, G; Nicolosi, P; Pelizzo, Mg; Rigato, F; Rigato, V; Giglia, A; Nannarone, Stefano. - In: APPLIED OPTICS. - ISSN 1559-128X. - STAMPA. - 45:22(2006), pp. 5642-5650. [10.1364/AO.45.005642]
Reflectance measurements and optical constants in the extreme ultraviolet-vacuum ultraviolet regions for SiC with a different C/Si ratio
NANNARONE, Stefano
2006
Abstract
Reflectance versus incidence angle measurements have been performed from 5 to 152 nm on samples of SiC with a different C/Si ratio deposited with rf magnetron sputtering. The optical constants of the material at different wavelengths have been determined by using a curve-fitting technique of reflectance values versus incidence angle. Complementary measurements of the incident beam polarization, film thickness, surface roughness, and stoichiometry were performed to complete the analysis of the samples.
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