The optical configuration of the monochromator for the new beamline X-MOSS at the ELETTRA synchrotron ring is described. The requirements for this instrument are to collect a 3 mrad X 2 mrad aperture beam produced by a bending magnet in the 3 - 1400 eV energy range; the energy resolution has to be 3000 or better over the whole range, with a focused beam of the order of 10 - 50 micrometer. The designed monochromator, presently under construction, is a slitless four grazing incidence optical elements: the first element is a one-meter paraboloidal mirror in sagittal focusing, then there is a plane mirror-plane grating dispersion system and finally a second one-meter paraboloidal mirror, also used in sagittal focusing. The latter focuses the radiation on the monochromator exit slit. This monochromator design is not limited by a defined working curve: in this way it is possible to select the preferred operational parameters, to optimize either the flux or the resolution or the high order rejection. The monochromatic beam is finally sent on the sample under examination by an ellipsoidal refocusing mirror
The monochromator for the synchrotron radiation beamline X-MOSS at ELETTRA / G., Naletto; M. G., Pelizzo; G., Tondello; Nannarone, Stefano; A., Giglia. - STAMPA. - 4145:(2001), pp. 105-105+. (Intervento presentato al convegno X-Ray Mirrors, Crystals, and Multilayers Conference tenutosi a SAN DIEGO, CA nel AUG 02-04, 2000) [10.1117/12.411626].
The monochromator for the synchrotron radiation beamline X-MOSS at ELETTRA
NANNARONE, Stefano;
2001
Abstract
The optical configuration of the monochromator for the new beamline X-MOSS at the ELETTRA synchrotron ring is described. The requirements for this instrument are to collect a 3 mrad X 2 mrad aperture beam produced by a bending magnet in the 3 - 1400 eV energy range; the energy resolution has to be 3000 or better over the whole range, with a focused beam of the order of 10 - 50 micrometer. The designed monochromator, presently under construction, is a slitless four grazing incidence optical elements: the first element is a one-meter paraboloidal mirror in sagittal focusing, then there is a plane mirror-plane grating dispersion system and finally a second one-meter paraboloidal mirror, also used in sagittal focusing. The latter focuses the radiation on the monochromator exit slit. This monochromator design is not limited by a defined working curve: in this way it is possible to select the preferred operational parameters, to optimize either the flux or the resolution or the high order rejection. The monochromatic beam is finally sent on the sample under examination by an ellipsoidal refocusing mirror
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