This paper presents a Multi-Subband Monte Carlo study of the drain current improvements in uniaxially, compressively strained (0 0 1)/[1 1 0] p-MOSFETs and analyzes the ingredients through which the strain improves the long channel mobility as well as the I(ON) of nanoscale transistors. We first discuss the strain induced mobility enhancement and then address the effects of the strain on the I(ON). In particular, our results show that compressive stress in (0 0 1)/[1 1 0] p-MOS transistors increases the I(ON) by improving both the injection velocity and the back-scattering coefficient and that, furthermore, the back-scattering coefficients of the p-MOS transistors have values comparable to those of n-MOS devices with similar channel length.

Drain Current Improvements in Uniaxially Strained p-MOSFETs: a Multi-Subband Monte Carlo Study / Conzatti, Francesco; DE MICHIELIS, Marco; Esseni, David; Palestri, Pierpaolo. - In: SOLID-STATE ELECTRONICS. - ISSN 0038-1101. - (2008), pp. 250-253. (Intervento presentato al convegno ESSDERC 2008 - 38th European Solid-State Device Research Conference tenutosi a Edimburgo (UK) nel Settembre 2008) [10.1109/ESSDERC.2008.4681745].

Drain Current Improvements in Uniaxially Strained p-MOSFETs: a Multi-Subband Monte Carlo Study

ESSENI, David;PALESTRI, Pierpaolo
2008

Abstract

This paper presents a Multi-Subband Monte Carlo study of the drain current improvements in uniaxially, compressively strained (0 0 1)/[1 1 0] p-MOSFETs and analyzes the ingredients through which the strain improves the long channel mobility as well as the I(ON) of nanoscale transistors. We first discuss the strain induced mobility enhancement and then address the effects of the strain on the I(ON). In particular, our results show that compressive stress in (0 0 1)/[1 1 0] p-MOS transistors increases the I(ON) by improving both the injection velocity and the back-scattering coefficient and that, furthermore, the back-scattering coefficients of the p-MOS transistors have values comparable to those of n-MOS devices with similar channel length.
2008
ESSDERC 2008 - 38th European Solid-State Device Research Conference
Edimburgo (UK)
Settembre 2008
250
253
Conzatti, Francesco; DE MICHIELIS, Marco; Esseni, David; Palestri, Pierpaolo
Drain Current Improvements in Uniaxially Strained p-MOSFETs: a Multi-Subband Monte Carlo Study / Conzatti, Francesco; DE MICHIELIS, Marco; Esseni, David; Palestri, Pierpaolo. - In: SOLID-STATE ELECTRONICS. - ISSN 0038-1101. - (2008), pp. 250-253. (Intervento presentato al convegno ESSDERC 2008 - 38th European Solid-State Device Research Conference tenutosi a Edimburgo (UK) nel Settembre 2008) [10.1109/ESSDERC.2008.4681745].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11380/1328035
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