Memristors have shown an extraordinary potential to emulate the plastic and dynamic electrical behaviors of biological synapses and have been already used to construct neuromorphic systems with in-memory computing and unsupervised learning capabilities; moreover, the small size and simple fabrication process of memristors make them ideal candidates for ultradense configurations. So far, the properties of memristive electronic synapses (i.e., potentiation/depression, relaxation, linearity) have been extensively analyzed by several groups. However, the dynamics of electroforming in memristive devices, which defines the position, size, shape, and chemical composition of the conductive nanofilaments across the device, has not been analyzed in depth. By applying ramped voltage stress (RVS), constant voltage stress (CVS), and pulsed voltage stress (PVS), we found that electroforming is highly affected by the biasing methods applied. We also found that the technique used to deposit the oxide, the chemical composition of the adjacent metal electrodes, and the polarity of the electrical stimuli applied have important effects on the dynamics of the electroforming process and in subsequent post-electroforming bipolar resistive switching. This work should be of interest to designers of memristive neuromorphic systems and could open the door for the implementation of new bioinspired functionalities into memristive neuromorphic systems.

Electroforming in Metal-Oxide Memristive Synapses / Wang, T.; Shi, Y.; Puglisi, F. M.; Chen, S.; Zhu, K.; Zuo, Y.; Li, X.; Jing, X.; Han, T.; Guo, B.; Bukvisova, K.; Kachtik, L.; Kolibal, M.; Wen, C.; Lanza, M.. - In: ACS APPLIED MATERIALS & INTERFACES. - ISSN 1944-8244. - 12:10(2020), pp. 11806-11814. [10.1021/acsami.9b19362]

Electroforming in Metal-Oxide Memristive Synapses

Puglisi F. M.;
2020

Abstract

Memristors have shown an extraordinary potential to emulate the plastic and dynamic electrical behaviors of biological synapses and have been already used to construct neuromorphic systems with in-memory computing and unsupervised learning capabilities; moreover, the small size and simple fabrication process of memristors make them ideal candidates for ultradense configurations. So far, the properties of memristive electronic synapses (i.e., potentiation/depression, relaxation, linearity) have been extensively analyzed by several groups. However, the dynamics of electroforming in memristive devices, which defines the position, size, shape, and chemical composition of the conductive nanofilaments across the device, has not been analyzed in depth. By applying ramped voltage stress (RVS), constant voltage stress (CVS), and pulsed voltage stress (PVS), we found that electroforming is highly affected by the biasing methods applied. We also found that the technique used to deposit the oxide, the chemical composition of the adjacent metal electrodes, and the polarity of the electrical stimuli applied have important effects on the dynamics of the electroforming process and in subsequent post-electroforming bipolar resistive switching. This work should be of interest to designers of memristive neuromorphic systems and could open the door for the implementation of new bioinspired functionalities into memristive neuromorphic systems.
2020
25-feb-2020
12
10
11806
11814
Electroforming in Metal-Oxide Memristive Synapses / Wang, T.; Shi, Y.; Puglisi, F. M.; Chen, S.; Zhu, K.; Zuo, Y.; Li, X.; Jing, X.; Han, T.; Guo, B.; Bukvisova, K.; Kachtik, L.; Kolibal, M.; Wen, C.; Lanza, M.. - In: ACS APPLIED MATERIALS & INTERFACES. - ISSN 1944-8244. - 12:10(2020), pp. 11806-11814. [10.1021/acsami.9b19362]
Wang, T.; Shi, Y.; Puglisi, F. M.; Chen, S.; Zhu, K.; Zuo, Y.; Li, X.; Jing, X.; Han, T.; Guo, B.; Bukvisova, K.; Kachtik, L.; Kolibal, M.; Wen, C.; Lanza, M.
File in questo prodotto:
Non ci sono file associati a questo prodotto.
Pubblicazioni consigliate

Licenza Creative Commons
I metadati presenti in IRIS UNIMORE sono rilasciati con licenza Creative Commons CC0 1.0 Universal, mentre i file delle pubblicazioni sono rilasciati con licenza Attribuzione 4.0 Internazionale (CC BY 4.0), salvo diversa indicazione.
In caso di violazione di copyright, contattare Supporto Iris

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11380/1201249
Citazioni
  • ???jsp.display-item.citation.pmc??? 1
  • Scopus 22
  • ???jsp.display-item.citation.isi??? 22
social impact