NbSi2 polycrystalline films, coevaporated and thermally annealed, were subjected to chemical and structural characterization, and then studied by reflectance from 0.06 to 6 eV and ellipsometry from 1.4 to 5 eV. The dielectric functions, obtained from Kramers-Kronig analysis and directly from ellipsometry, are also presented. Low-frequency free-carrier response is discussed in terms of the Drude model; the high-frequency interband structures are interpreted on the basis of the calculated density of states and photoemission results. A comparison is made with the optical properties of isoelectronic VSi2 and TaSi2 Polycrystalline films.
OPTICAL STUDY OF NIOBIUM DISILICIDE POLYCRYSTALLINE FILMS / Amiotti, M; Borghesi, A; Marabelli, F; Guizzetti, G; Nava, Filippo. - In: PHYSICAL REVIEW. B, CONDENSED MATTER. - ISSN 0163-1829. - 44:(1991), pp. 3757-3761.
OPTICAL STUDY OF NIOBIUM DISILICIDE POLYCRYSTALLINE FILMS
NAVA, Filippo
1991-01-01
Abstract
NbSi2 polycrystalline films, coevaporated and thermally annealed, were subjected to chemical and structural characterization, and then studied by reflectance from 0.06 to 6 eV and ellipsometry from 1.4 to 5 eV. The dielectric functions, obtained from Kramers-Kronig analysis and directly from ellipsometry, are also presented. Low-frequency free-carrier response is discussed in terms of the Drude model; the high-frequency interband structures are interpreted on the basis of the calculated density of states and photoemission results. A comparison is made with the optical properties of isoelectronic VSi2 and TaSi2 Polycrystalline films.
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