NbSi2 polycrystalline films, coevaporated and thermally annealed, were subjected to chemical and structural characterization, and then studied by reflectance from 0.06 to 6 eV and ellipsometry from 1.4 to 5 eV. The dielectric functions, obtained from Kramers-Kronig analysis and directly from ellipsometry, are also presented. Low-frequency free-carrier response is discussed in terms of the Drude model; the high-frequency interband structures are interpreted on the basis of the calculated density of states and photoemission results. A comparison is made with the optical properties of isoelectronic VSi2 and TaSi2 Polycrystalline films.
OPTICAL STUDY OF NIOBIUM DISILICIDE POLYCRYSTALLINE FILMS / Amiotti, M; Borghesi, A; Marabelli, F; Guizzetti, G; Nava, Filippo. - In: PHYSICAL REVIEW. B, CONDENSED MATTER. - ISSN 0163-1829. - 44:(1991), pp. 3757-3761.
OPTICAL STUDY OF NIOBIUM DISILICIDE POLYCRYSTALLINE FILMS
NAVA, Filippo
1991
Abstract
NbSi2 polycrystalline films, coevaporated and thermally annealed, were subjected to chemical and structural characterization, and then studied by reflectance from 0.06 to 6 eV and ellipsometry from 1.4 to 5 eV. The dielectric functions, obtained from Kramers-Kronig analysis and directly from ellipsometry, are also presented. Low-frequency free-carrier response is discussed in terms of the Drude model; the high-frequency interband structures are interpreted on the basis of the calculated density of states and photoemission results. A comparison is made with the optical properties of isoelectronic VSi2 and TaSi2 Polycrystalline films.
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