In this work, we describe how the frequency dependence of conductance (G) and capacitance (C) of a generic MOS capacitor results in peaks of the functions G/ω and - ωdC/dω. By means of TCAD simulations, we show that G/ω and -ωdC/dω peak at the same value and at the same frequency for every bias point from accumulation to inversion. We illustrate how the properties of the peaks change with the semiconductor doping (ND), oxide capacitance (COX), minority carrier lifetime (τg), interface defect parameters (NIT, σ) and majority carrier dielectric relaxation time (τr). Finally, we demonstrate how these insights on G/ω and -ωdC/dω can be used to extract COX, ND and τg from InGaAs MOSCAP measurements
Relationship between capacitance and conductance in MOS capacitors / Caruso, E.; Lin, J.; Monaghan, S.; Cherkaoui, K.; Floyd, L.; Gity, F.; Palestri, P.; Esseni, D.; Selmi, L.; Hurley, P. K.. - (2019), pp. 1-4. (Intervento presentato al convegno International Conference on Simulation of Semiconductor Processes and Devices tenutosi a Udine nel 4-6 settembre 2019) [10.1109/SISPAD.2019.8870553].
Relationship between capacitance and conductance in MOS capacitors
Palestri, P.;Selmi, L.;
2019
Abstract
In this work, we describe how the frequency dependence of conductance (G) and capacitance (C) of a generic MOS capacitor results in peaks of the functions G/ω and - ωdC/dω. By means of TCAD simulations, we show that G/ω and -ωdC/dω peak at the same value and at the same frequency for every bias point from accumulation to inversion. We illustrate how the properties of the peaks change with the semiconductor doping (ND), oxide capacitance (COX), minority carrier lifetime (τg), interface defect parameters (NIT, σ) and majority carrier dielectric relaxation time (τr). Finally, we demonstrate how these insights on G/ω and -ωdC/dω can be used to extract COX, ND and τg from InGaAs MOSCAP measurementsFile | Dimensione | Formato | |
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