This paper presents a new self-consistent MC simulator for the 2D electron gas of nano-MOSFETs. The simulator is two-dimensional in real space and in k-space, and accounts for the electron gas degeneracy in the k-plane. Simulations of thin-film SOI MOSFETs show that the subband structure and the carrier degeneracy strongly affect the transport properties particularly the injection velocity. Our results also point-out the strong anisotropy of the occupation function, which seriously hampers the use of simulators based on the momentum of the BTE

Multi-subband Monte Carlo modeling of nano-MOSFETs with strong vertical quantization and electron gas degeneration / Lucci, Luca; Palestri, Pierpaolo; Esseni, David; Selmi, Luca. - STAMPA. - 2005:(2005), pp. 631-634. (Intervento presentato al convegno IEEE International Electron Device Meeting (IEDM) 2005 tenutosi a Washington, DC, MD, usa nel 5-7 dicembre 2005) [10.1109/IEDM.2005.1609425].

Multi-subband Monte Carlo modeling of nano-MOSFETs with strong vertical quantization and electron gas degeneration

PALESTRI, Pierpaolo;SELMI, Luca
2005

Abstract

This paper presents a new self-consistent MC simulator for the 2D electron gas of nano-MOSFETs. The simulator is two-dimensional in real space and in k-space, and accounts for the electron gas degeneracy in the k-plane. Simulations of thin-film SOI MOSFETs show that the subband structure and the carrier degeneracy strongly affect the transport properties particularly the injection velocity. Our results also point-out the strong anisotropy of the occupation function, which seriously hampers the use of simulators based on the momentum of the BTE
2005
IEEE International Electron Device Meeting (IEDM) 2005
Washington, DC, MD, usa
5-7 dicembre 2005
2005
631
634
Lucci, Luca; Palestri, Pierpaolo; Esseni, David; Selmi, Luca
Multi-subband Monte Carlo modeling of nano-MOSFETs with strong vertical quantization and electron gas degeneration / Lucci, Luca; Palestri, Pierpaolo; Esseni, David; Selmi, Luca. - STAMPA. - 2005:(2005), pp. 631-634. (Intervento presentato al convegno IEEE International Electron Device Meeting (IEDM) 2005 tenutosi a Washington, DC, MD, usa nel 5-7 dicembre 2005) [10.1109/IEDM.2005.1609425].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11380/1163504
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