This paper presents the results of a comparison among five Monte Carlo device simulators for nano-scale MOSFETs. These models are applied to the simulation of the I-V characteristics of a 25 nm gate-length MOSFET representative of the high-performance transistor of the 65 nm technology node. Appreciable differences between the simulators are obtained in terms of simulated ION. These differences are mainly related to different treatments of the ionized impurity scattering (IIS) and pinpoint a limitation of the available models for screening effects at very large carrier concentrations.
Comparison of Monte Carlo Transport Models for Nanometer-Size MOSFETs / Fiegna, C; Braccioli, M; BRUGGER S., C; BUFLER F., M; Dollfus, P; AUBRY FORTUNA, V; Jungemann, C; Meinerzhagen, B; Palestri, Pierpaolo; GALDIN RETAILLEAU, S; Sangiorgi, E; Schenk, A; Selmi, Luca. - STAMPA. - (2007), pp. 57-60. (Intervento presentato al convegno Proc. IEEE SISPAD 2007 Conference tenutosi a Wien (A), settembre 2007 nel 25-27/09/2007) [10.1007/978-3-211-72861-1_14].
Comparison of Monte Carlo Transport Models for Nanometer-Size MOSFETs
PALESTRI, Pierpaolo;SELMI, Luca
2007
Abstract
This paper presents the results of a comparison among five Monte Carlo device simulators for nano-scale MOSFETs. These models are applied to the simulation of the I-V characteristics of a 25 nm gate-length MOSFET representative of the high-performance transistor of the 65 nm technology node. Appreciable differences between the simulators are obtained in terms of simulated ION. These differences are mainly related to different treatments of the ionized impurity scattering (IIS) and pinpoint a limitation of the available models for screening effects at very large carrier concentrations.
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