This work investigates the strain engineering in InAs nanowire Tunnel-FETs. To this purpose we developed a simulator based on the NEGF formalism and employing an 8×8 k·p Hamiltonian. The model accounts for arbitrary crystal orientations and describes the strain implicitly by a modification of the bandstructure. Elastic and inelastic phonon scattering is also accounted for in the self-consistent Born approximation. Our results show that appropriate strain conditions in InAs Tunnel- FETs enable: (a) a remarkable enhancement of the Ion with no significant degradation of the subthreshold slope (SS); (b) large improvements in the Ioff versus Ion tradeoff for low Ioff and VDD values; (c) significant widening of Ioff and VDD window where Tunnel-FETs can compete with silicon MOSFETs.

A simulation study of strain induced performance enhancements in InAs nanowire Tunnel-FETs / Conzatti, Francesco; M. G., Pala; Esseni, David; E., Bano; Selmi, Luca. - (2011), pp. 5.2.4-5.2.4. (Intervento presentato al convegno 2011 IEEE International Electron Devices Meeting, IEDM 2011 tenutosi a Washington, DC, usa nel 2011) [10.1109/IEDM.2011.6131492].

A simulation study of strain induced performance enhancements in InAs nanowire Tunnel-FETs

SELMI, Luca
2011

Abstract

This work investigates the strain engineering in InAs nanowire Tunnel-FETs. To this purpose we developed a simulator based on the NEGF formalism and employing an 8×8 k·p Hamiltonian. The model accounts for arbitrary crystal orientations and describes the strain implicitly by a modification of the bandstructure. Elastic and inelastic phonon scattering is also accounted for in the self-consistent Born approximation. Our results show that appropriate strain conditions in InAs Tunnel- FETs enable: (a) a remarkable enhancement of the Ion with no significant degradation of the subthreshold slope (SS); (b) large improvements in the Ioff versus Ion tradeoff for low Ioff and VDD values; (c) significant widening of Ioff and VDD window where Tunnel-FETs can compete with silicon MOSFETs.
2011
2011 IEEE International Electron Devices Meeting, IEDM 2011
Washington, DC, usa
2011
5.2.4
5.2.4
Conzatti, Francesco; M. G., Pala; Esseni, David; E., Bano; Selmi, Luca
A simulation study of strain induced performance enhancements in InAs nanowire Tunnel-FETs / Conzatti, Francesco; M. G., Pala; Esseni, David; E., Bano; Selmi, Luca. - (2011), pp. 5.2.4-5.2.4. (Intervento presentato al convegno 2011 IEEE International Electron Devices Meeting, IEDM 2011 tenutosi a Washington, DC, usa nel 2011) [10.1109/IEDM.2011.6131492].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11380/1162834
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