The present work deals with the mechanical behaviour of thin films bonded to a homogeneous elastic orthotropic half plane under plain strain condition and infinitesimal strain. Both the film and semi-infinite substrate display linear elastic orthotropic behaviour. By assuming perfect adhesion between film and half plane together with membrane behaviour of the film, the compatibility condition between the coating and substrate leads to a singular integral equation with Cauchy kernel. Such an equation is straightforwardly solved by expanding the unknown interfacial stress in series of Chebyshev polynomials displaying square-root singularity at the film edges. This approach allows handling the singular behaviour of the shear stress and, in turn, reducing the problem to a linear algebraic system of infinite terms. Results are found for two loading cases, with particular reference to concentrated axial forces acting at the edges of the film. The corresponding mode II stress intensity factor has been assessed, thus providing the stress concentrations at both ends of the covering. Possible applications of the results here obtained range from MEMS, NEMS, and solar Silicon cell for energy harvesting to welded joint and building foundation.
Finite Thin Cover on an Orthotropic Elastic Half Plane / Falope, FEDERICO OYEDEJI; Radi, Enrico. - In: MODELLING AND SIMULATION IN ENGINEERING. - ISSN 1687-5591. - ELETTRONICO. - 2016:(2016), pp. 1-11. [10.1155/2016/5393621]
Finite Thin Cover on an Orthotropic Elastic Half Plane
FALOPE, FEDERICO OYEDEJI;RADI, Enrico
2016
Abstract
The present work deals with the mechanical behaviour of thin films bonded to a homogeneous elastic orthotropic half plane under plain strain condition and infinitesimal strain. Both the film and semi-infinite substrate display linear elastic orthotropic behaviour. By assuming perfect adhesion between film and half plane together with membrane behaviour of the film, the compatibility condition between the coating and substrate leads to a singular integral equation with Cauchy kernel. Such an equation is straightforwardly solved by expanding the unknown interfacial stress in series of Chebyshev polynomials displaying square-root singularity at the film edges. This approach allows handling the singular behaviour of the shear stress and, in turn, reducing the problem to a linear algebraic system of infinite terms. Results are found for two loading cases, with particular reference to concentrated axial forces acting at the edges of the film. The corresponding mode II stress intensity factor has been assessed, thus providing the stress concentrations at both ends of the covering. Possible applications of the results here obtained range from MEMS, NEMS, and solar Silicon cell for energy harvesting to welded joint and building foundation.File | Dimensione | Formato | |
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