The influence of the substrate wetting properties on the grid assisted deposition of tris-(8-hydroxyquinolinato)aluminum(Ill) (Alq(3)) Onto Si/SiOx Surfaces was investigated. Different degrees of hydrophilicity/hydrophobicity on the Si/SiOx were obtained by changing the surface chemical functionalities with wet treatments. We observed that the deposited Alq(3) films can be spatially controlled and assembled either into continuous grid-like stripes or ordered dots depending upon the wetting properties of the substrate
Influence of the substrate hydrophilicity on the grid assisted deposition of tris-(8-hydroxyquinolinato) aluminum(III) thin films / M., Massi; M., Cavallini; Biscarini, Fabio. - In: SURFACE SCIENCE. - ISSN 0039-6028. - ELETTRONICO. - 603:3(2009), pp. 503-506. [10.1016/j.susc.2008.12.012]
Influence of the substrate hydrophilicity on the grid assisted deposition of tris-(8-hydroxyquinolinato) aluminum(III) thin films
BISCARINI, FABIO
2009
Abstract
The influence of the substrate wetting properties on the grid assisted deposition of tris-(8-hydroxyquinolinato)aluminum(Ill) (Alq(3)) Onto Si/SiOx Surfaces was investigated. Different degrees of hydrophilicity/hydrophobicity on the Si/SiOx were obtained by changing the surface chemical functionalities with wet treatments. We observed that the deposited Alq(3) films can be spatially controlled and assembled either into continuous grid-like stripes or ordered dots depending upon the wetting properties of the substrate
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