The interactions of thick-film (cermet) resstors with terminations of various metals prepared on alumina substrates has been investigated. The resistivity was studied as a function of resistor length and temperature. The point-to-point voltage drop was measured over the entire length of the resistors. SEM and EDAX were used to investigate the termination material, the termination-resistor interface and the resistor, both lengthwise over the specimen and vertically downward into the substrate. The results show that bismuth, a common component of these termination materials, is primarily responsible of these interactions because bismuth has high diffusivity and high solubility in the matrix of the resistor. Moreover, a strong interaction of bismuth with the alumina substrate was observed.

Interactions between thick-film resistors and terminations: the role of bismuth / M., Prudenziati; Morten, Bruno; L., Moro; L., Olumekor; A., Tombesi. - In: JOURNAL OF PHYSICS D. APPLIED PHYSICS. - ISSN 0022-3727. - STAMPA. - 19:(1986), pp. 275-282.

Interactions between thick-film resistors and terminations: the role of bismuth

MORTEN, Bruno;
1986

Abstract

The interactions of thick-film (cermet) resstors with terminations of various metals prepared on alumina substrates has been investigated. The resistivity was studied as a function of resistor length and temperature. The point-to-point voltage drop was measured over the entire length of the resistors. SEM and EDAX were used to investigate the termination material, the termination-resistor interface and the resistor, both lengthwise over the specimen and vertically downward into the substrate. The results show that bismuth, a common component of these termination materials, is primarily responsible of these interactions because bismuth has high diffusivity and high solubility in the matrix of the resistor. Moreover, a strong interaction of bismuth with the alumina substrate was observed.
1986
19
275
282
Interactions between thick-film resistors and terminations: the role of bismuth / M., Prudenziati; Morten, Bruno; L., Moro; L., Olumekor; A., Tombesi. - In: JOURNAL OF PHYSICS D. APPLIED PHYSICS. - ISSN 0022-3727. - STAMPA. - 19:(1986), pp. 275-282.
M., Prudenziati; Morten, Bruno; L., Moro; L., Olumekor; A., Tombesi
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11380/744180
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