Nanomachining and beam-assisted Pt deposition by a focused ion beam (FIB) was used to modify AFM probes for improved electric force measurements.. Si3N4 cantilevers have been endowed with a nano-electrode at the tip apex to confine the electro-sensitive area at the very tip. This action results in both a marked decrease of the parasitic capacitive effect and in an improved electric force microscopy (EFM) contrast and resolution, with respect to usual, full metal-coated cantilevers. This fabrication approach is suited to the development of innovative electro-sensitive probes, useful in different scanning probe techniques.
Focused ion beam-nanomachined probes for improved electric force microscopy / C., Menozzi; Gazzadi, G. C.; Alessandrini, Andrea; P., Facci. - In: ULTRAMICROSCOPY. - ISSN 0304-3991. - STAMPA. - 104:3-4(2005), pp. 220-225. [10.1016/j.ultramic.2005.04.004]
Focused ion beam-nanomachined probes for improved electric force microscopy
C. Menozzi;ALESSANDRINI, Andrea;
2005
Abstract
Nanomachining and beam-assisted Pt deposition by a focused ion beam (FIB) was used to modify AFM probes for improved electric force measurements.. Si3N4 cantilevers have been endowed with a nano-electrode at the tip apex to confine the electro-sensitive area at the very tip. This action results in both a marked decrease of the parasitic capacitive effect and in an improved electric force microscopy (EFM) contrast and resolution, with respect to usual, full metal-coated cantilevers. This fabrication approach is suited to the development of innovative electro-sensitive probes, useful in different scanning probe techniques.
Pubblicazioni consigliate
I metadati presenti in IRIS UNIMORE sono rilasciati con licenza Creative Commons CC0 1.0 Universal, mentre i file delle pubblicazioni sono rilasciati con licenza Attribuzione 4.0 Internazionale (CC BY 4.0), salvo diversa indicazione.
In caso di violazione di copyright, contattare Supporto Iris
