Using the plasma model for the metal dielectric function we have calculated the electromagnetic fluctuation induced force of a free standing metallic film in vacuum as a function of the film size and plasma frequency. If the film is deposited onto a substrate or interacts with a plate, both the sign and the value of the force are modified. Il is shown that the force can change sign from attractice to repulsive upon changing the substrate plasma frequency.

A study of the electromagnetic-fluctuation-induced forces on thin metallic films / Benassi, A; CALANDRA BUONAURA, Carlo. - In: JOURNAL OF PHYSICS. A, MATHEMATICAL AND THEORETICAL. - ISSN 1751-8113. - STAMPA. - 40:44(2007), pp. 13453-13466. [10.1088/1751-8113/40/44/022]

A study of the electromagnetic-fluctuation-induced forces on thin metallic films

CALANDRA BUONAURA, Carlo
2007

Abstract

Using the plasma model for the metal dielectric function we have calculated the electromagnetic fluctuation induced force of a free standing metallic film in vacuum as a function of the film size and plasma frequency. If the film is deposited onto a substrate or interacts with a plate, both the sign and the value of the force are modified. Il is shown that the force can change sign from attractice to repulsive upon changing the substrate plasma frequency.
2007
40
44
13453
13466
A study of the electromagnetic-fluctuation-induced forces on thin metallic films / Benassi, A; CALANDRA BUONAURA, Carlo. - In: JOURNAL OF PHYSICS. A, MATHEMATICAL AND THEORETICAL. - ISSN 1751-8113. - STAMPA. - 40:44(2007), pp. 13453-13466. [10.1088/1751-8113/40/44/022]
Benassi, A; CALANDRA BUONAURA, Carlo
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11380/609662
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