Using the plasma model for the metal dielectric function we have calculated the electromagnetic fluctuation induced force of a free standing metallic film in vacuum as a function of the film size and plasma frequency. If the film is deposited onto a substrate or interacts with a plate, both the sign and the value of the force are modified. Il is shown that the force can change sign from attractice to repulsive upon changing the substrate plasma frequency.
A study of the electromagnetic-fluctuation-induced forces on thin metallic films / Benassi, A; CALANDRA BUONAURA, Carlo. - In: JOURNAL OF PHYSICS. A, MATHEMATICAL AND THEORETICAL. - ISSN 1751-8113. - STAMPA. - 40:44(2007), pp. 13453-13466. [10.1088/1751-8113/40/44/022]
A study of the electromagnetic-fluctuation-induced forces on thin metallic films
CALANDRA BUONAURA, Carlo
2007
Abstract
Using the plasma model for the metal dielectric function we have calculated the electromagnetic fluctuation induced force of a free standing metallic film in vacuum as a function of the film size and plasma frequency. If the film is deposited onto a substrate or interacts with a plate, both the sign and the value of the force are modified. Il is shown that the force can change sign from attractice to repulsive upon changing the substrate plasma frequency.
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