We present a theoretical investigation of the reaction occurring at the interfaces between silicon and transition metals. Using the same approach successfully applied to the study of bulk silicides,the electronic properties of different models of silicon-nickel and silicon-palladium interfaces have been studied. The models investigated include: (a) epitaxial silicon-silicide interfaces; (b)isolated transition metal interstitials near the silicon surfaces; (c) adamantane geometry structures as metastable diffusion layer compounds. The theoretical results are used as a guide in order to interpret the available experimental photoemission data of these complex interfaces.

Electronic structure and properties of Silicon - transition metals reactive interfaces / Bisi, Olmes; L. W., Chiao; K. N., Tu. - In: SURFACE SCIENCE. - ISSN 0039-6028. - STAMPA. - 152/153:(1985), pp. 1185-1190.

Electronic structure and properties of Silicon - transition metals reactive interfaces

BISI, Olmes;
1985

Abstract

We present a theoretical investigation of the reaction occurring at the interfaces between silicon and transition metals. Using the same approach successfully applied to the study of bulk silicides,the electronic properties of different models of silicon-nickel and silicon-palladium interfaces have been studied. The models investigated include: (a) epitaxial silicon-silicide interfaces; (b)isolated transition metal interstitials near the silicon surfaces; (c) adamantane geometry structures as metastable diffusion layer compounds. The theoretical results are used as a guide in order to interpret the available experimental photoemission data of these complex interfaces.
1985
152/153
1185
1190
Electronic structure and properties of Silicon - transition metals reactive interfaces / Bisi, Olmes; L. W., Chiao; K. N., Tu. - In: SURFACE SCIENCE. - ISSN 0039-6028. - STAMPA. - 152/153:(1985), pp. 1185-1190.
Bisi, Olmes; L. W., Chiao; K. N., Tu
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11380/449348
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