The initial stages of cobalt film growth on a MgO(001) surface was studied by methods of sample surface structure imaging by reflected electrons, low-energy electron diffraction, and Auger electron spectroscopy. The measurements were performed at room temperature for cobalt layer thicknesses up to 40 angstrom. It is established that cobalt film growth proceeds according to the island mechanism. In the interval of cobalt film thicknesses below similar to 10 angstrom, the dominating surface phase has the form of cobalt islands with an fcc structure; at greater layer thicknesses, the surface film consists predominantly of cobalt grains with an hcp structure.
Initial stages of cobalt film growth on MgO(001) surface / I., Pronin; Da, Valdaitsev; As, Voronchikhin; Mv, Gomoyunova; Sf, Contri; Benedetti, Stefania; P., Luches; Valeri, Sergio. - In: TECHNICAL PHYSICS LETTERS. - ISSN 1063-7850. - STAMPA. - 31:(2005), pp. 494-497. [10.1134/1.1969777]
Initial stages of cobalt film growth on MgO(001) surface
BENEDETTI, Stefania;VALERI, Sergio
2005
Abstract
The initial stages of cobalt film growth on a MgO(001) surface was studied by methods of sample surface structure imaging by reflected electrons, low-energy electron diffraction, and Auger electron spectroscopy. The measurements were performed at room temperature for cobalt layer thicknesses up to 40 angstrom. It is established that cobalt film growth proceeds according to the island mechanism. In the interval of cobalt film thicknesses below similar to 10 angstrom, the dominating surface phase has the form of cobalt islands with an fcc structure; at greater layer thicknesses, the surface film consists predominantly of cobalt grains with an hcp structure.
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