Lead zirconate titanate (PZT) thin films were deposited by rf magnetron sputtering on Pt/Ti/SiO(2)//Si, Au/Ti/SiO2//Si, ITO//glass electrodes and on Si (100) substrates. As deposited films show large excesses of Pb and O and contain different Pb oxides. Annealing treatments in air at 650 and 750 degrees C carried out in a preheated muffle furnace lead to a decrease of Pb and O content and to formation of the perovskite phase via an intermediate nanocrystalline pyrochlore phase. Phase pure perovskite films are obtained on Pt and ITO electrodes by annealing at 750 degrees C for similar to 10 min, while for the same treatment significant amounts of pyrochlore remained on Au electrodes and on Si substrates.

Structural characterization of lead zirconate titanate thin films prepared on different electrodes and on silicon substrates / M., Natali; Garoli, Denis; V., Rigato; Romanato, Filippo. - In: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY. A, AN INTERNATIONAL JOURNAL DEVOTED TO VACUUM, SURFACES, AND FILMS. - ISSN 1553-1813. - 29:(2011), p. 061505. [10.1116/1.3635366]

Structural characterization of lead zirconate titanate thin films prepared on different electrodes and on silicon substrates

GAROLI, DENIS;
2011

Abstract

Lead zirconate titanate (PZT) thin films were deposited by rf magnetron sputtering on Pt/Ti/SiO(2)//Si, Au/Ti/SiO2//Si, ITO//glass electrodes and on Si (100) substrates. As deposited films show large excesses of Pb and O and contain different Pb oxides. Annealing treatments in air at 650 and 750 degrees C carried out in a preheated muffle furnace lead to a decrease of Pb and O content and to formation of the perovskite phase via an intermediate nanocrystalline pyrochlore phase. Phase pure perovskite films are obtained on Pt and ITO electrodes by annealing at 750 degrees C for similar to 10 min, while for the same treatment significant amounts of pyrochlore remained on Au electrodes and on Si substrates.
2011
29
061505
Structural characterization of lead zirconate titanate thin films prepared on different electrodes and on silicon substrates / M., Natali; Garoli, Denis; V., Rigato; Romanato, Filippo. - In: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY. A, AN INTERNATIONAL JOURNAL DEVOTED TO VACUUM, SURFACES, AND FILMS. - ISSN 1553-1813. - 29:(2011), p. 061505. [10.1116/1.3635366]
M., Natali; Garoli, Denis; V., Rigato; Romanato, Filippo
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11380/1315950
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