In this paper, we present a novel method to reduce the subthreshold swing (SS) of FETs below 60 mV/decade. Through modeling, we directly relate trap charge movement between the gate electrode and the gate dielectric to SS reduction. We experimentally investigate the impact of charge exchange between a Cu gate electrode and a 5-nm-thick amorphous Al2O3 gate dielectric in an InGaZnO4 thin-film transistor. Positive trap charges are generated inside the gate dielectric while the semiconductor is in accumulation. During the subsequent detrapping, the SS diminishes to a minimum value of 46 mV/decade at room temperature. Furthermore, we relate the charge trapping/detrapping effects to a negative capacitance behavior of the Cu/Al2O3 metal-insulator structure.

Charge Trapping Mechanism Leading to Sub-60-mV/decade-Swing FETs / Daus, A; Vogt, C; Münzenrieder, N; Petti, L; Knobelspies, S; Cantarella, G; Luisier, M; Salvatore, Ga; Troster, G. - In: IEEE TRANSACTIONS ON ELECTRON DEVICES. - ISSN 0018-9383. - 64:7(2017), pp. 2789-2796. [10.1109/TED.2017.2703914]

Charge Trapping Mechanism Leading to Sub-60-mV/decade-Swing FETs

Cantarella G;
2017

Abstract

In this paper, we present a novel method to reduce the subthreshold swing (SS) of FETs below 60 mV/decade. Through modeling, we directly relate trap charge movement between the gate electrode and the gate dielectric to SS reduction. We experimentally investigate the impact of charge exchange between a Cu gate electrode and a 5-nm-thick amorphous Al2O3 gate dielectric in an InGaZnO4 thin-film transistor. Positive trap charges are generated inside the gate dielectric while the semiconductor is in accumulation. During the subsequent detrapping, the SS diminishes to a minimum value of 46 mV/decade at room temperature. Furthermore, we relate the charge trapping/detrapping effects to a negative capacitance behavior of the Cu/Al2O3 metal-insulator structure.
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Charge Trapping Mechanism Leading to Sub-60-mV/decade-Swing FETs / Daus, A; Vogt, C; Münzenrieder, N; Petti, L; Knobelspies, S; Cantarella, G; Luisier, M; Salvatore, Ga; Troster, G. - In: IEEE TRANSACTIONS ON ELECTRON DEVICES. - ISSN 0018-9383. - 64:7(2017), pp. 2789-2796. [10.1109/TED.2017.2703914]
Daus, A; Vogt, C; Münzenrieder, N; Petti, L; Knobelspies, S; Cantarella, G; Luisier, M; Salvatore, Ga; Troster, G
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11380/1290901
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