Detailed simulations are necessary to correctly interpret the charge polarity of electron beam irradiated thin film patch. Relying on systematic simulations we provide guidelines and movies to interpret experimentally the polarity of the charged area, to be understood as the sign of the electrostatic potential developed under the beam with reference to a ground electrode. We discuss the two methods most frequently used to assess charge polarity: Fresnel imaging of the irradiated area and Thon rings analysis. We also briefly discuss parameter optimization for hole free phase plate (HFPP) imaging. Our results are particularly relevant to understanding contrast of hole-free phase plate imaging and Berriman effect.

Computer simulations analysis for determining the polarity of charge generated by high energy electron irradiation of a thin film / Malac, M.; Hettler, S.; Hayashida, M.; Kawasaki, M.; Konyuba, Y.; Okura, Y.; Iijima, H.; Ishikawa, I.; Beleggia, M.. - In: MICRON. - ISSN 0968-4328. - 100:(2017), pp. 10-22. [10.1016/j.micron.2017.03.015]

Computer simulations analysis for determining the polarity of charge generated by high energy electron irradiation of a thin film

Beleggia M.
2017

Abstract

Detailed simulations are necessary to correctly interpret the charge polarity of electron beam irradiated thin film patch. Relying on systematic simulations we provide guidelines and movies to interpret experimentally the polarity of the charged area, to be understood as the sign of the electrostatic potential developed under the beam with reference to a ground electrode. We discuss the two methods most frequently used to assess charge polarity: Fresnel imaging of the irradiated area and Thon rings analysis. We also briefly discuss parameter optimization for hole free phase plate (HFPP) imaging. Our results are particularly relevant to understanding contrast of hole-free phase plate imaging and Berriman effect.
2017
100
10
22
Computer simulations analysis for determining the polarity of charge generated by high energy electron irradiation of a thin film / Malac, M.; Hettler, S.; Hayashida, M.; Kawasaki, M.; Konyuba, Y.; Okura, Y.; Iijima, H.; Ishikawa, I.; Beleggia, M.. - In: MICRON. - ISSN 0968-4328. - 100:(2017), pp. 10-22. [10.1016/j.micron.2017.03.015]
Malac, M.; Hettler, S.; Hayashida, M.; Kawasaki, M.; Konyuba, Y.; Okura, Y.; Iijima, H.; Ishikawa, I.; Beleggia, M.
File in questo prodotto:
Non ci sono file associati a questo prodotto.
Pubblicazioni consigliate

Licenza Creative Commons
I metadati presenti in IRIS UNIMORE sono rilasciati con licenza Creative Commons CC0 1.0 Universal, mentre i file delle pubblicazioni sono rilasciati con licenza Attribuzione 4.0 Internazionale (CC BY 4.0), salvo diversa indicazione.
In caso di violazione di copyright, contattare Supporto Iris

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11380/1270646
Citazioni
  • ???jsp.display-item.citation.pmc??? 1
  • Scopus 14
  • ???jsp.display-item.citation.isi??? 13
social impact