EnglishA new microscopic silicon model for hole transport at high electric fields featuring two valence bands in a finite Brillouin zone is presented. The band parameters and the electron-phonon coupling constants were determined by best fitting the density of states and the experimental and theoretical results for transport properties in the low and intermediate field-strength range. Hole impact ionization has been introduced following a new scheme that goes beyond the limitations contained in the Keldysh formula. The present model, coupled to an analogous model already developed for electrons, allows study of bipolar transport in silicon devices. Applications to bulk Si and Si p-MOSFETs are presented.
A MULTIBAND MODEL FOR HOLE TRANSPORT IN SILICON AT HIGH-ENERGIES / Abramo, A; Venturi, F; Sangiorgi, E; Fiegna, C; Ricco, B; Brunetti, Rossella; Quade, W; Jacoboni, Carlo. - In: SEMICONDUCTOR SCIENCE AND TECHNOLOGY. - ISSN 0268-1242. - STAMPA. - 7(1992), pp. B597-B600.
| Data di pubblicazione: | 1992 |
| Titolo: | A MULTIBAND MODEL FOR HOLE TRANSPORT IN SILICON AT HIGH-ENERGIES |
| Autore/i: | Abramo, A; Venturi, F; Sangiorgi, E; Fiegna, C; Ricco, B; Brunetti, Rossella; Quade, W; Jacoboni, Carlo |
| Autore/i UNIMORE: | |
| Rivista: | |
| Volume: | 7 |
| Pagina iniziale: | B597 |
| Pagina finale: | B600 |
| Codice identificativo ISI: | WOS:A1992HL26200159 |
| Citazione: | A MULTIBAND MODEL FOR HOLE TRANSPORT IN SILICON AT HIGH-ENERGIES / Abramo, A; Venturi, F; Sangiorgi, E; Fiegna, C; Ricco, B; Brunetti, Rossella; Quade, W; Jacoboni, Carlo. - In: SEMICONDUCTOR SCIENCE AND TECHNOLOGY. - ISSN 0268-1242. - STAMPA. - 7(1992), pp. B597-B600. |
| Tipologia | Articolo su rivista |
File in questo prodotto:
I documenti presenti in Iris Unimore sono rilasciati con licenza Creative Commons Attribuzione - Non commerciale - Non opere derivate 3.0 Italia, salvo diversa indicazione.
In caso di violazione di copyright, contattare Supporto Iris
Copyright © 2021