Three-dimensional patterning of gold nano-particles on SiO2 and Si substrates is performed by ion-beam lithography with 15-20 nm resolution. Realization of an on-demand achiral and chiral modifications of nano-structures are demonstrated. Simulations of optical properties of the obtained nano-architectures reveal the possibility to tailor the field enhancement both in the spatial and spectral domains, which are foreseen to be applicable for light harvesting and opto-mechanics at nanoscale.
Tailoring plasmonic field enhancement in spatial and spectral domains / Juodkazis, S.; Rosa, Lorenzo; Gervinskas, G.; Brasselet, E.. - (2012). (Intervento presentato al convegno International Conference on Optical MEMS and Nanophotonics (OMN), 2012 tenutosi a Banff, Canada nel 6-9 agosto 2012) [10.1109/OMEMS.2012.6318839].
Tailoring plasmonic field enhancement in spatial and spectral domains
ROSA, Lorenzo;
2012
Abstract
Three-dimensional patterning of gold nano-particles on SiO2 and Si substrates is performed by ion-beam lithography with 15-20 nm resolution. Realization of an on-demand achiral and chiral modifications of nano-structures are demonstrated. Simulations of optical properties of the obtained nano-architectures reveal the possibility to tailor the field enhancement both in the spatial and spectral domains, which are foreseen to be applicable for light harvesting and opto-mechanics at nanoscale.
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