Three dimensional (3D) ion beam lithography (IBL) is used to directly pattern 3D photonic crystal (PhC) structures in crystalline titania. The process is maskless and direct write. The slanted pore 3D structures with pore diameters of 100 nm having aspect ratio of 8 were formed. It is shown that chemical enhancement of titania removal up to 5.2 times is possible in XeF2 gas for the closest nozzle-to-sample distance; the enhancement was similar to 1.5 times for the actual 3D patterning due to a sample tilt. Tolerances of structural parameters and optimization of IBL processing required for the fabrication of PhCs with full photonic bandgap in visible spectral range in rutile are outlined. Application potential of 3D-IBL is discussed. (c) 2011 Optical Society of America

Sculpturing of photonic crystals by ion beam lithography: towards complete photonic bandgap at visible wavelengths / Juodkazis, Saulius; Rosa, Lorenzo; Bauerdick, Sven; Peto, Lloyd; El Ganainy, Ramy; John, Sajeev. - In: OPTICS EXPRESS. - ISSN 1094-4087. - 19:7(2011), pp. 5802-5810. [10.1364/OE.19.005802]

Sculpturing of photonic crystals by ion beam lithography: towards complete photonic bandgap at visible wavelengths

ROSA, Lorenzo;
2011

Abstract

Three dimensional (3D) ion beam lithography (IBL) is used to directly pattern 3D photonic crystal (PhC) structures in crystalline titania. The process is maskless and direct write. The slanted pore 3D structures with pore diameters of 100 nm having aspect ratio of 8 were formed. It is shown that chemical enhancement of titania removal up to 5.2 times is possible in XeF2 gas for the closest nozzle-to-sample distance; the enhancement was similar to 1.5 times for the actual 3D patterning due to a sample tilt. Tolerances of structural parameters and optimization of IBL processing required for the fabrication of PhCs with full photonic bandgap in visible spectral range in rutile are outlined. Application potential of 3D-IBL is discussed. (c) 2011 Optical Society of America
2011
19
7
5802
5810
Sculpturing of photonic crystals by ion beam lithography: towards complete photonic bandgap at visible wavelengths / Juodkazis, Saulius; Rosa, Lorenzo; Bauerdick, Sven; Peto, Lloyd; El Ganainy, Ramy; John, Sajeev. - In: OPTICS EXPRESS. - ISSN 1094-4087. - 19:7(2011), pp. 5802-5810. [10.1364/OE.19.005802]
Juodkazis, Saulius; Rosa, Lorenzo; Bauerdick, Sven; Peto, Lloyd; El Ganainy, Ramy; John, Sajeev
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11380/1138536
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