A simple solution to lithographically write down to 20-30 nm features over micrometer-sized nanoparticle arrays with high fidelity of pattern transfer from the designed to fabricated architectures is shown. It is achieved via a two-step approach: (i) fabrication of basic shape nanoparticles by electron beam lithography, gold deposition via sputtering and lift-off, then (ii) nano-patterning by focused ion beam lithography. Application potential of 3D tailored nanoparticles for nanotweezers is discussed on the basis of numerical modeling and experimental measurements of extinction.
Arrays of Arbitrarily Shaped Nanoparticles: Overlay-Errorless Direct Ion Write / Gervinskas, Gediminas; Seniutinas, Gediminas; Rosa, Lorenzo; Juodkazis, Saulius. - In: ADVANCED OPTICAL MATERIALS. - ISSN 2195-1071. - 1:6(2013), pp. 456-459. [10.1002/adom.201300027]
Arrays of Arbitrarily Shaped Nanoparticles: Overlay-Errorless Direct Ion Write
ROSA, Lorenzo;
2013
Abstract
A simple solution to lithographically write down to 20-30 nm features over micrometer-sized nanoparticle arrays with high fidelity of pattern transfer from the designed to fabricated architectures is shown. It is achieved via a two-step approach: (i) fabrication of basic shape nanoparticles by electron beam lithography, gold deposition via sputtering and lift-off, then (ii) nano-patterning by focused ion beam lithography. Application potential of 3D tailored nanoparticles for nanotweezers is discussed on the basis of numerical modeling and experimental measurements of extinction.
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