New method based on HR-LIPSS for diffraction grating formation on preliminary fabricated p-n junction on Si substrate are suggested. This allows to produce surface plasmonpolariton photodetectors based on periodically corrugated thin metal plasmon-carrying films.
Diffraction gratings prepared by HR-LIPSS for new surface plasmon-polariton photodetectors and Sensors / Gnilitskyi, Iaroslav; Mamykin, Sergiy; Dusheyko, Mykhaylo; Borodinova, Tatiana; Maksimchuk, Nataliia; Orazi, Leonardo. - 2016:(2016), p. JW4A.88. (Intervento presentato al convegno Frontiers in Optics, FiO 2016 tenutosi a usa nel 2016) [10.1364/FIO.2016.JW4A.88].
Diffraction gratings prepared by HR-LIPSS for new surface plasmon-polariton photodetectors and Sensors
GNILITSKYI, IAROSLAV;ORAZI, Leonardo
2016
Abstract
New method based on HR-LIPSS for diffraction grating formation on preliminary fabricated p-n junction on Si substrate are suggested. This allows to produce surface plasmonpolariton photodetectors based on periodically corrugated thin metal plasmon-carrying films.
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