With this paper we report on an extensive analysis of the degradation of AlGaN/GaN Schottky diodes, submitted to reverse-bias stress tests. The analysis is based on combined electrical measurements and 2D simulation. Results indicate that stress may induce a gradual increase in the leakage current of the devices. Capacitance-Voltage investigation was used as a tool for the analysis of the modifications in device structure generated during the stress tests. We demonstrate a new failure mechanism which consist in the formation of donor-like traps on the GaN-side of the AlGaN/GaN interface, and can explain the observed increase in diode leakage. 2D simulation was used to support the hypothesis on degradation, and to extrapolate the parameters of the trap responsible for the degradation process.

A novel degradation mechanism of AlGaN/GaN/Silicon heterostructures related to the generation of interface traps / Meneghini, M.; Bertin, M.; Dal Santo, G.; Stocco, A.; Chini, Alessandro; Marcon, D.; Malinowski, P. E.; Mura, G.; Musu, E.; Vanzi, M.; Meneghesso, G.; Zanoni, E.. - (2012), p. 13.3.4. (Intervento presentato al convegno 2012 IEEE International Electron Devices Meeting, IEDM 2012 tenutosi a San Francisco, CA, usa nel 10-13 December 2012) [10.1109/IEDM.2012.6479035].

A novel degradation mechanism of AlGaN/GaN/Silicon heterostructures related to the generation of interface traps

CHINI, Alessandro;
2012

Abstract

With this paper we report on an extensive analysis of the degradation of AlGaN/GaN Schottky diodes, submitted to reverse-bias stress tests. The analysis is based on combined electrical measurements and 2D simulation. Results indicate that stress may induce a gradual increase in the leakage current of the devices. Capacitance-Voltage investigation was used as a tool for the analysis of the modifications in device structure generated during the stress tests. We demonstrate a new failure mechanism which consist in the formation of donor-like traps on the GaN-side of the AlGaN/GaN interface, and can explain the observed increase in diode leakage. 2D simulation was used to support the hypothesis on degradation, and to extrapolate the parameters of the trap responsible for the degradation process.
2012
2012 IEEE International Electron Devices Meeting, IEDM 2012
San Francisco, CA, usa
10-13 December 2012
13.3.4
Meneghini, M.; Bertin, M.; Dal Santo, G.; Stocco, A.; Chini, Alessandro; Marcon, D.; Malinowski, P. E.; Mura, G.; Musu, E.; Vanzi, M.; Meneghesso, G.; Zanoni, E.
A novel degradation mechanism of AlGaN/GaN/Silicon heterostructures related to the generation of interface traps / Meneghini, M.; Bertin, M.; Dal Santo, G.; Stocco, A.; Chini, Alessandro; Marcon, D.; Malinowski, P. E.; Mura, G.; Musu, E.; Vanzi, M.; Meneghesso, G.; Zanoni, E.. - (2012), p. 13.3.4. (Intervento presentato al convegno 2012 IEEE International Electron Devices Meeting, IEDM 2012 tenutosi a San Francisco, CA, usa nel 10-13 December 2012) [10.1109/IEDM.2012.6479035].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11380/1077385
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