The modifications of the stoichiometry, morphology and surface structure of cerium oxide ultrathin films induced by thermal treatments under vacuum and oxygen partial pressure were studied using in situ X-ray photoemission spectroscopy, scanning tunnelling microscopy and low energy electron diffraction. The effect of the film nominal thickness, heating temperature and heating time on the degree of reduction of the film was investigated. The reduction is more relevant on the film surface, where different ordered surface structures were observed at different degrees of reduction for very thin films. The obtained results are discussed taking into account the dimensionality of the oxide and the effects of the proximity of the Pt substrate. After reduction it was always possible to re-oxidize the films back to their original oxidation state by thermal treatment under oxygen-rich conditions.
Structural and morphological modifications of thermally reduced cerium oxide ultrathin epitaxial films on Pt(111) / Luches, P.; Pagliuca, F.; Valeri, Sergio. - In: PHYSICAL CHEMISTRY CHEMICAL PHYSICS. - ISSN 1463-9076. - 16:35(2014), pp. 18848-18857. [10.1039/c4cp02723j]
Structural and morphological modifications of thermally reduced cerium oxide ultrathin epitaxial films on Pt(111)
VALERI, Sergio
2014
Abstract
The modifications of the stoichiometry, morphology and surface structure of cerium oxide ultrathin films induced by thermal treatments under vacuum and oxygen partial pressure were studied using in situ X-ray photoemission spectroscopy, scanning tunnelling microscopy and low energy electron diffraction. The effect of the film nominal thickness, heating temperature and heating time on the degree of reduction of the film was investigated. The reduction is more relevant on the film surface, where different ordered surface structures were observed at different degrees of reduction for very thin films. The obtained results are discussed taking into account the dimensionality of the oxide and the effects of the proximity of the Pt substrate. After reduction it was always possible to re-oxidize the films back to their original oxidation state by thermal treatment under oxygen-rich conditions.File | Dimensione | Formato | |
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