An innovative multilayer growth of InAs quantum dots on GaAs(100) is demonstrated to lead to self-aggregation of correlated quantum dot chains over mesoscopic distances. The fundamental idea is that at critical growth conditions is possible to drive the dot nucleation only at precise locations corresponding to the local minima of the Indium chemical potential. Differently from the known dot multilayers, where nucleation of new dots on top of the buried ones is driven by the surface strain originating from the dots below, here the spatial correlations and nucleation of additional dots are mostly dictated by a self-engineering of the surface occurring during the growth, close to the critical conditions for dot formation under the fixed oblique direction of the incoming As flux, that drives the In surface diffusion.
Manipulating surface diffusion and elastic interactions to obtain quantum dot multilayer arrangements over different length scales / E., Placidi; F., Arciprete; V., Latini; S., Latini; Magri, Rita; M., Scuderi; G., Nicotra; F., Patella. - In: APPLIED PHYSICS LETTERS. - ISSN 0003-6951. - STAMPA. - 105:11(2014), pp. 111905-1-111905-4. [10.1063/1.4896028]
Manipulating surface diffusion and elastic interactions to obtain quantum dot multilayer arrangements over different length scales
MAGRI, Rita;
2014
Abstract
An innovative multilayer growth of InAs quantum dots on GaAs(100) is demonstrated to lead to self-aggregation of correlated quantum dot chains over mesoscopic distances. The fundamental idea is that at critical growth conditions is possible to drive the dot nucleation only at precise locations corresponding to the local minima of the Indium chemical potential. Differently from the known dot multilayers, where nucleation of new dots on top of the buried ones is driven by the surface strain originating from the dots below, here the spatial correlations and nucleation of additional dots are mostly dictated by a self-engineering of the surface occurring during the growth, close to the critical conditions for dot formation under the fixed oblique direction of the incoming As flux, that drives the In surface diffusion.File | Dimensione | Formato | |
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