The aim of this study is to investigate occupational exposure to extremely low frequency (ELF) electric fields (EF) in office work. The background electric fields (n = 4) were 2- 25V/m and the highest electric field measured was 1000 V/m. Different devices found in the office environment were measured for EF exposure. Results included, e.g., (1) spot lamps: 400V/m and 1000V/m (from surface) and 30V/m (distance 50 cm), (2) coffee maker: 10-20V/m (from surface), (3) the transformer of a computer: 100-200V/m (from surface), (4) the alternator of a cellular phone: 40-60 V/m, (5) a UPS (uninterruptible power supply): 300V/m (from surface) and 5V/m (distance 1 m), (6) a PC table speaker: 250V/m (from surface). The measured values obtained are clearly below 10 000V/m threshold stipulated in the guidelines of ICNIRP (The International Commission on Non-ionizing Radiation Protection).

Occupational Exposure to Extremely Low Frequency Electric Fields in Office Work / Pääkkönen, R.; Tarao, H; Gobba, F.; Korpinen, L.. - STAMPA. - (2012), pp. 823-825. (Intervento presentato al convegno Progress in Electromagnetics Research Symposium, PIERS 2012 Moscow tenutosi a Moscow, Russia nel 19-23 August 2012).

Occupational Exposure to Extremely Low Frequency Electric Fields in Office Work

Gobba F.;
2012

Abstract

The aim of this study is to investigate occupational exposure to extremely low frequency (ELF) electric fields (EF) in office work. The background electric fields (n = 4) were 2- 25V/m and the highest electric field measured was 1000 V/m. Different devices found in the office environment were measured for EF exposure. Results included, e.g., (1) spot lamps: 400V/m and 1000V/m (from surface) and 30V/m (distance 50 cm), (2) coffee maker: 10-20V/m (from surface), (3) the transformer of a computer: 100-200V/m (from surface), (4) the alternator of a cellular phone: 40-60 V/m, (5) a UPS (uninterruptible power supply): 300V/m (from surface) and 5V/m (distance 1 m), (6) a PC table speaker: 250V/m (from surface). The measured values obtained are clearly below 10 000V/m threshold stipulated in the guidelines of ICNIRP (The International Commission on Non-ionizing Radiation Protection).
2012
Progress in Electromagnetics Research Symposium, PIERS 2012 Moscow
Moscow, Russia
19-23 August 2012
823
825
Pääkkönen, R.; Tarao, H; Gobba, F.; Korpinen, L.
Occupational Exposure to Extremely Low Frequency Electric Fields in Office Work / Pääkkönen, R.; Tarao, H; Gobba, F.; Korpinen, L.. - STAMPA. - (2012), pp. 823-825. (Intervento presentato al convegno Progress in Electromagnetics Research Symposium, PIERS 2012 Moscow tenutosi a Moscow, Russia nel 19-23 August 2012).
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11380/1036919
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