Microwave activated plasma shows advantages on obtaining high-density coatings with advanced mechanical properties, since these kinds of plasma allow to activate precursor molecules with high binding energy. We have developed a novel pulsed microwave plasma source, whose shape allows to obtain a large toroidal plasma emission zone, with a constant emission rate on the whole circumference of the emitting source. This design allows the deposition on relatively large and oddshaped samples. Plasma can be active on a large pressure range (10-2 /10 Torr), with a base pressure of 10-6 Torr to ensure a good purity for mechanical coatings. The microwave source was designed in order to fit on any kind of vacuum system equipped with a ISO standard 200 mm flange, regardless on the mounting direction. The pulsed microwave source uses a solid state power supply able to pulse the magnetron up to 8 kW peak, with a square waveform having excellent dynamic characteristic.
A novel cylindrical microwave plasma source / Garuti, M.; Balocchi, P.; Botti, C.; Veronesi, P.; Leonelli, C.; Rettighieri, L.; Balestrazzi, A.; Valeri, S.. - (2005), pp. 98-101. (Intervento presentato al convegno 10th International Conference on Microwave and High Frequency Heating 2005 tenutosi a Faculty of Engineering of the University of Modena and Reggio Emilia, ita nel 2005).
A novel cylindrical microwave plasma source
Veronesi P.;Leonelli C.;Valeri S.
2005
Abstract
Microwave activated plasma shows advantages on obtaining high-density coatings with advanced mechanical properties, since these kinds of plasma allow to activate precursor molecules with high binding energy. We have developed a novel pulsed microwave plasma source, whose shape allows to obtain a large toroidal plasma emission zone, with a constant emission rate on the whole circumference of the emitting source. This design allows the deposition on relatively large and oddshaped samples. Plasma can be active on a large pressure range (10-2 /10 Torr), with a base pressure of 10-6 Torr to ensure a good purity for mechanical coatings. The microwave source was designed in order to fit on any kind of vacuum system equipped with a ISO standard 200 mm flange, regardless on the mounting direction. The pulsed microwave source uses a solid state power supply able to pulse the magnetron up to 8 kW peak, with a square waveform having excellent dynamic characteristic.
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