Microwave activated plasma shows advantages on obtaining high-density coatings with advanced mechanical properties, since these kinds of plasma allow to activate precursor molecules with high binding energy. We have developed a novel pulsed microwave plasma source, whose shape allows to obtain a large toroidal plasma emission zone, with a constant emission rate on the whole circumference of the emitting source. This design allows the deposition on relatively large and oddshaped samples. Plasma can be active on a large pressure range (10-2 /10 Torr), with a base pressure of 10-6 Torr to ensure a good purity for mechanical coatings. The microwave source was designed in order to fit on any kind of vacuum system equipped with a ISO standard 200 mm flange, regardless on the mounting direction. The pulsed microwave source uses a solid state power supply able to pulse the magnetron up to 8 kW peak, with a square waveform having excellent dynamic characteristic.

A novel cylindrical microwave plasma source / Garuti, M.; Balocchi, P.; Botti, C.; Veronesi, P.; Leonelli, C.; Rettighieri, L.; Balestrazzi, A.; Valeri, S.. - (2005), pp. 98-101. (Intervento presentato al convegno 10th International Conference on Microwave and High Frequency Heating 2005 tenutosi a Faculty of Engineering of the University of Modena and Reggio Emilia, ita nel 2005).

A novel cylindrical microwave plasma source

Veronesi P.;Leonelli C.;Valeri S.
2005

Abstract

Microwave activated plasma shows advantages on obtaining high-density coatings with advanced mechanical properties, since these kinds of plasma allow to activate precursor molecules with high binding energy. We have developed a novel pulsed microwave plasma source, whose shape allows to obtain a large toroidal plasma emission zone, with a constant emission rate on the whole circumference of the emitting source. This design allows the deposition on relatively large and oddshaped samples. Plasma can be active on a large pressure range (10-2 /10 Torr), with a base pressure of 10-6 Torr to ensure a good purity for mechanical coatings. The microwave source was designed in order to fit on any kind of vacuum system equipped with a ISO standard 200 mm flange, regardless on the mounting direction. The pulsed microwave source uses a solid state power supply able to pulse the magnetron up to 8 kW peak, with a square waveform having excellent dynamic characteristic.
2005
10th International Conference on Microwave and High Frequency Heating 2005
Faculty of Engineering of the University of Modena and Reggio Emilia, ita
2005
Garuti, M.; Balocchi, P.; Botti, C.; Veronesi, P.; Leonelli, C.; Rettighieri, L.; Balestrazzi, A.; Valeri, S.
A novel cylindrical microwave plasma source / Garuti, M.; Balocchi, P.; Botti, C.; Veronesi, P.; Leonelli, C.; Rettighieri, L.; Balestrazzi, A.; Valeri, S.. - (2005), pp. 98-101. (Intervento presentato al convegno 10th International Conference on Microwave and High Frequency Heating 2005 tenutosi a Faculty of Engineering of the University of Modena and Reggio Emilia, ita nel 2005).
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11380/1200092
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