A printing process for obtaining patterns of nanometer and micrometer dimensions on a substrate, comprising i) the application of a solution or suspension of an imprinting material to the substrate, ii) the positioning, without applying pressure, of a stamp provided with relief patterns at a distance of 0 nm to 500 μm from the substrate, and iii) the evaporation of the solution or suspension.
Method for manufacturing and controlling structures and patterns of soluble and colloidal substances by printing on the micrometer and nanometer scale and with reduction of the dimensions of the stamp's features / Biscarini, Fabio; Cavallini, Massimiliano. - (2002).
Method for manufacturing and controlling structures and patterns of soluble and colloidal substances by printing on the micrometer and nanometer scale and with reduction of the dimensions of the stamp's features
BISCARINI, FABIO;
2002
Abstract
A printing process for obtaining patterns of nanometer and micrometer dimensions on a substrate, comprising i) the application of a solution or suspension of an imprinting material to the substrate, ii) the positioning, without applying pressure, of a stamp provided with relief patterns at a distance of 0 nm to 500 μm from the substrate, and iii) the evaporation of the solution or suspension.
Pubblicazioni consigliate
I metadati presenti in IRIS UNIMORE sono rilasciati con licenza Creative Commons CC0 1.0 Universal, mentre i file delle pubblicazioni sono rilasciati con licenza Attribuzione 4.0 Internazionale (CC BY 4.0), salvo diversa indicazione.
In caso di violazione di copyright, contattare Supporto Iris
