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Physical Mechanisms behind the Field-Cycling Behavior of HfO2-Based Ferroelectric Capacitors
2016 Pesic, Milan; Fengler, Franz Paul Gustav; Larcher, Luca; Padovani, Andrea; Schenk, Tony; Grimley, Everett D.; Sang, Xiahan; Lebeau, James M.; Slesazeck, Stefan; Schroeder, Uwe; Mikolajick, Thomas
Root cause of degradation in novel HfO2-based ferroelectric memories
2016 Pesic, Milan; Fengler, Franz P. G.; Slesazeck, Stefan; Schroeder, Uwe; Mikolajick, Thomas; Larcher, Luca; Padovani, Andrea
| Titolo | Data di pubblicazione | Autore(i) | File |
|---|---|---|---|
| Physical Mechanisms behind the Field-Cycling Behavior of HfO2-Based Ferroelectric Capacitors | 1-gen-2016 | Pesic, Milan; Fengler, Franz Paul Gustav; Larcher, Luca; Padovani, Andrea; Schenk, Tony; Grimley, Everett D.; Sang, Xiahan; Lebeau, James M.; Slesazeck, Stefan; Schroeder, Uwe; Mikolajick, Thomas | |
| Root cause of degradation in novel HfO2-based ferroelectric memories | 1-gen-2016 | Pesic, Milan; Fengler, Franz P. G.; Slesazeck, Stefan; Schroeder, Uwe; Mikolajick, Thomas; Larcher, Luca; Padovani, Andrea |