A set of Mo/Si periodic multilayers is studied by non-destructive analysis methods. The thickness of the Si layers is 5 nm while the thickness of the Mo layers changes from one multilayer to another, from 2 to 4 nm. This enables us to probe the effect of the transition between the amorphous and crystalline state of the Mo layers near the interfaces with Si on the optical performances of the multilayers. This transition results in the variation of the refractive index (density variation) of the Mo layers, as observed by X-ray reflectivity (XRR) at a wavelength of 0.154 nm. Combining X-ray emission spectroscopy (XES) and XRR, the parameters (composition, thickness and roughness) of the interfacial layers formed by the interaction between the Mo and Si layers are determined. However, these parameters do not evolve significantly as a function of the Mo thickness. It is observed by diffuse scattering at 1.33 nm that the lateral correlation length of the roughness strongly decreases when the Mo thickness goes from 2 to 3 nm. This is due to the development of Mo crystallites parallel to the multilayer surface.

Analysis of periodic Mo/Si multilayers: Influence of the Mo thickness / H., Maury; J. M., André; K., Le Guen; N., Mahne; A., Giglia; Nannarone, Stefano; F., Bridou; F., Delmotte; P., Jonnard. - In: SURFACE SCIENCE. - ISSN 0039-6028. - STAMPA. - 603:2(2009), pp. 407-411. [10.1016/j.susc.2008.12.002]

Analysis of periodic Mo/Si multilayers: Influence of the Mo thickness

NANNARONE, Stefano;
2009

Abstract

A set of Mo/Si periodic multilayers is studied by non-destructive analysis methods. The thickness of the Si layers is 5 nm while the thickness of the Mo layers changes from one multilayer to another, from 2 to 4 nm. This enables us to probe the effect of the transition between the amorphous and crystalline state of the Mo layers near the interfaces with Si on the optical performances of the multilayers. This transition results in the variation of the refractive index (density variation) of the Mo layers, as observed by X-ray reflectivity (XRR) at a wavelength of 0.154 nm. Combining X-ray emission spectroscopy (XES) and XRR, the parameters (composition, thickness and roughness) of the interfacial layers formed by the interaction between the Mo and Si layers are determined. However, these parameters do not evolve significantly as a function of the Mo thickness. It is observed by diffuse scattering at 1.33 nm that the lateral correlation length of the roughness strongly decreases when the Mo thickness goes from 2 to 3 nm. This is due to the development of Mo crystallites parallel to the multilayer surface.
2009
603
2
407
411
Analysis of periodic Mo/Si multilayers: Influence of the Mo thickness / H., Maury; J. M., André; K., Le Guen; N., Mahne; A., Giglia; Nannarone, Stefano; F., Bridou; F., Delmotte; P., Jonnard. - In: SURFACE SCIENCE. - ISSN 0039-6028. - STAMPA. - 603:2(2009), pp. 407-411. [10.1016/j.susc.2008.12.002]
H., Maury; J. M., André; K., Le Guen; N., Mahne; A., Giglia; Nannarone, Stefano; F., Bridou; F., Delmotte; P., Jonnard
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11380/743035
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