The variation of the size of coherently-diffracting domains and strain due to annealing at moderate temperature (500 °C) has been estimated for plasma-sprayed Ni using X-ray Powder Diffraction (XRPD) and line broadening analysis in conjunction with classical and modified Williamson-Hall methods. It was found that annealing provokes a narrowing of Ni diffraction peaks which was basically associated to a decrease in dislocations present in the as-sprayed material. The evolution of the microstructure with temperature of plasma-sprayed Ni was studied by in situ X-ray Powder Diffraction (XRPD). It was found that the breadth of the Ni profiles continuously decreased with heating up to 500 C, mainly due to healing of dislocations. These results were used to explain the irreversible decrease in electrical resistance of plasma-sprayed Ni resistors after annealing which was previously observed in our laboratory.
|Anno di pubblicazione:||2009|
|Titolo:||Annealing effects on plasma-sprayed Ni: An XRPD study|
|Autori:||Lassinantti Gualtieri, Magdalena; Prudenziati, Maria; Gualtieri, Alessandro F|
|Appare nelle tipologie:||Articolo su rivista|
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