Using personal dosimeters, occupational exposure to ELF-MF was measured in 150 workers employed in 28 different occupations. The main results are presented. The overall arithmetical mean in the whole sample was 0.36 microT, the overall geometric mean 0.21 microT. A high variability among workers engaged in the same occupation, and among different days in the same worker, was observed. The results suggest a relatively low exposure to ELF-MF in the large part of workers. Nevertheless, the higher levels measured in some workers, and the high variability, show the need of adequate measurements of ELF-MF exposure in workers.
Livelli di esposizione occupazionale a campi elettromagnetici a frequenza estremamente bassa ELF) in lavoratori addetti a varie mansioni / Gobba, Fabriziomaria; Rossi, P; Roccatto, L.. - In: GIORNALE ITALIANO DI MEDICINA DEL LAVORO ED ERGONOMIA. - ISSN 1592-7830. - STAMPA. - 25:(2003), pp. 214-215. (Intervento presentato al convegno 66° CONGRESSO NAZIONALE SIMLII tenutosi a BARI nel 19 OTTOBRE 2003).
Livelli di esposizione occupazionale a campi elettromagnetici a frequenza estremamente bassa ELF) in lavoratori addetti a varie mansioni.
GOBBA, Fabriziomaria;
2003
Abstract
Using personal dosimeters, occupational exposure to ELF-MF was measured in 150 workers employed in 28 different occupations. The main results are presented. The overall arithmetical mean in the whole sample was 0.36 microT, the overall geometric mean 0.21 microT. A high variability among workers engaged in the same occupation, and among different days in the same worker, was observed. The results suggest a relatively low exposure to ELF-MF in the large part of workers. Nevertheless, the higher levels measured in some workers, and the high variability, show the need of adequate measurements of ELF-MF exposure in workers.
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