Long-channel effective mobilities as well as transfer characteristics of a 32 nm single-gate SOI and a 16 nm double-gate (DG) MOSFET have been simulated with live different Monte Carlo (MC) device simulators. The differences are mostly rather small for the SOI-FET with quantum effects having a minor effect on threshold voltage due to the lowly doped channel, while the two multi-subband MC simulators show some prominent deviations in the case of the DG-FET. High-K mobility degradation by remote phonon scattering (RPS) in free carrier MC approximation leads to smaller performance degradation compared to multi-subband MC with remote Coulomb scattering (RCS) and RPS, but requires further investigations.

Comparison of Semiclassical Transport Formulations Including Quantum Corrections for Advanced Devices with High-K Gate Stacks / BUFLER F., M; AUBRY FORTUNA, V; Bournel, A; Braccioli, M; Dollfus, P; Esseni, David; Fiegna, C; Gamizk, F; DE MICHIELIS, Marco; Palestri, Pierpaolo; SAINT MARTIN, J; Sampedrok, C; Sangiorgi, E; Selmi, Luca; Toniutti, Paolo. - STAMPA. - (2010), pp. 319-322. (Intervento presentato al convegno INTERNATIONAL WORKSHOP ON COMPUTATIONAL ELECTRONICS (IWCE 2010) tenutosi a Pisa (Italia), ottobre 2010 nel Ottobre) [10.1109/IWCE.2010.5677952].

Comparison of Semiclassical Transport Formulations Including Quantum Corrections for Advanced Devices with High-K Gate Stacks

PALESTRI, Pierpaolo;SELMI, Luca;
2010

Abstract

Long-channel effective mobilities as well as transfer characteristics of a 32 nm single-gate SOI and a 16 nm double-gate (DG) MOSFET have been simulated with live different Monte Carlo (MC) device simulators. The differences are mostly rather small for the SOI-FET with quantum effects having a minor effect on threshold voltage due to the lowly doped channel, while the two multi-subband MC simulators show some prominent deviations in the case of the DG-FET. High-K mobility degradation by remote phonon scattering (RPS) in free carrier MC approximation leads to smaller performance degradation compared to multi-subband MC with remote Coulomb scattering (RCS) and RPS, but requires further investigations.
2010
INTERNATIONAL WORKSHOP ON COMPUTATIONAL ELECTRONICS (IWCE 2010)
Pisa (Italia), ottobre 2010
Ottobre
319
322
BUFLER F., M; AUBRY FORTUNA, V; Bournel, A; Braccioli, M; Dollfus, P; Esseni, David; Fiegna, C; Gamizk, F; DE MICHIELIS, Marco; Palestri, Pierpaolo; SAINT MARTIN, J; Sampedrok, C; Sangiorgi, E; Selmi, Luca; Toniutti, Paolo
Comparison of Semiclassical Transport Formulations Including Quantum Corrections for Advanced Devices with High-K Gate Stacks / BUFLER F., M; AUBRY FORTUNA, V; Bournel, A; Braccioli, M; Dollfus, P; Esseni, David; Fiegna, C; Gamizk, F; DE MICHIELIS, Marco; Palestri, Pierpaolo; SAINT MARTIN, J; Sampedrok, C; Sangiorgi, E; Selmi, Luca; Toniutti, Paolo. - STAMPA. - (2010), pp. 319-322. (Intervento presentato al convegno INTERNATIONAL WORKSHOP ON COMPUTATIONAL ELECTRONICS (IWCE 2010) tenutosi a Pisa (Italia), ottobre 2010 nel Ottobre) [10.1109/IWCE.2010.5677952].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11380/1163069
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